Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 8/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | RECQL | P46063 | 6/20 | 0.47 |
| ▸ | MAPT | P10636 | 6/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | APEX1 | P27695 | 3/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.47 |
| ▸ | MTOR | P42345 | 2/20 | 0.47 |
| ▸ | BLM | P54132 | 2/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.47 |
| ▸ | THPO | P40225 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.47 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.47 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30374855 | 1.00 | TDP1 (0.48) | TDP1TP53RECQLMAPTKDM4E | |
| SCHEMBL29637883 | 1.00 | TDP1 (0.48) | TDP1TP53RECQLMAPTKDM4E | |
| SCHEMBL29465801 | 0.93 | TP53 (0.54) | TDP1TP53MAPTKDM4EHIF1A | |
| SCHEMBL674987 | 0.93 | TP53 (0.54) | TDP1TP53MAPTKDM4EHIF1A | |
| SCHEMBL1596751 | 0.91 | TP53 (0.52) | TDP1TP53MAPTKDM4EHIF1A | |
| SCHEMBL29373036 | 0.88 | TDP1 (0.44) | TDP1RECQLMAPTKDM4EKMT2A | |
| SCHEMBL36227 | 0.88 | TDP1 (0.44) | TDP1RECQLMAPTKDM4EKMT2A | |
| SCHEMBL24282281 | 0.88 | ALDH1A1 (0.53) | TDP1TP53RECQLMAPTKDM4E | |
| SCHEMBL109026 | 0.86 | TDP1 (0.54) | TDP1RECQLMAPTKDM4EKMT2A | |
| SCHEMBL31516962 | 0.86 | TDP1 (0.54) | TDP1RECQLMAPTKDM4EKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 420 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7879528-B2 | For forming pattern that prevents contamination within the exposure apparatus; lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-02-01 | — | — | US | claimed |
| US-20080176170-A1 | RESIST COMPOSITION FOR ELECTRON BEAM OR EUV | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-07-24 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| US-5817610-A | Non-corrosive cleaning composition for removing plasma etching residues | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1998-10-06 | — | — | US | claimed |
| WO-2025079919-A1 | PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-04-17 | — | — | WO | disclosed |
| US-20240384116-A1 | MODIFIED EPOXY RESIN AND ELECTRODEPOSITION COATING MATERIAL | KANSAI PAINT CO., LTD. (JP) | 2024-11-21 | — | — | US | disclosed |
| EP-4410858-A1 | MODIFIED EPOXY RESIN AND ELECTRODEPOSITION COATING MATERIAL | Kansai Paint Co., Ltd. (JP) | 2024-08-07 | — | — | EP | disclosed |
| US-20240248396-A1 | XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PRODUCING CURED OBJECT, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2024-07-25 | — | — | US | disclosed |
| US-11953830-B2 | Photosensitive resin composition, photosensitive resin sheet, cured film, method for producing cured film, organic EL display device and electronic component | TORAY INDUSTRIES, INC. (JP) | 2024-04-09 | — | — | US | disclosed |
| EP-4023694-B1 | EPOXY GROUP-CONTAINING POLYORGANOSILOXANE, CURABLE RESIN COMPOSITION CONTAINING EPOXY GROUP-CONTAINING POLYORGANOSILOXANE, AND CURED PRODUCT OF SAME | MITSUBISHI CHEM CORP (JP) | 2024-02-14 | — | — | EP | disclosed |
| US-6316170-B2 | COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-11-13 | — | — | US | disclosed |
| EP-1146394-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-10-17 | — | — | EP | disclosed |
| US-20010006767-A1 | Developing solution and method of forming polyimide pattern by using the developing solution | YOSHIAKI KAWAMONZEN | 2001-07-05 | — | — | US | disclosed |
| EP-0943640-A1 | HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME | UNITIKA LTD. (JP) | 1999-09-22 | — | — | EP | disclosed |
| US-5856058-A | HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| EP-0828197-A1 | Photoresist stripping and cleaning compositions | Olin Microelectronic Chemicals, Inc. (US) | 1998-03-11 | — | — | EP | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240248396-A1 | XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PRODUCING CURED OBJECT, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE | NLRP3, XPA, ASIC1 | TDP1 3005/4885TP53 4753/4885RECQL 1468/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.