SCHEMBL36239

SCHEMBL36239

CCC1(C(OC(C2(CC)COC2)C2(CC)COC2)C2(CC)COC2)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL504534 0.85
SCHEMBL28297752 0.81
SCHEMBL1956858 0.78
SCHEMBL1954810 0.76
SCHEMBL3416616 0.75 EPHX1 (0.39)
SCHEMBL21459247 0.74
SCHEMBL9918180 0.74
SCHEMBL5821445 0.73
SCHEMBL17818696 0.73
SCHEMBL27674545 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 943 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12016187-B2 Encapsulating composition LG CHEM, LTD. (KR) 2024-06-18 US claimed
US-20230323014-A1 ELECTROCHROMIC MULTI-LAYER DEVICES WITH CROSS-LINKED ION CONDUCTING POLYMER HALIO INC (US) 2023-10-12 US claimed
EP-4206820-A1 HYBRID PHOTOCURABLE COMPOSITION ARKEMA FRANCE (FR) 2023-07-05 EP claimed
EP-3498788-B1 SOLDER MASK INKJET INKS FOR MANUFACTURING PRINTED CIRCUIT BOARDS AGFA GEVAERT NV (BE) 2023-05-03 EP claimed
EP-4097163-A1 PHOTO RADIATION CURABLE EPOXY FOR ELECTRICAL COMPONENTS Hitachi Energy Switzerland AG (CH) 2022-12-07 EP claimed
CN-112143284-B Radiation-curable ink and use thereof 常州强力电子新材料股份有限公司 2022-09-27 CN claimed
CN-114096612-A Photoradiation curable epoxy resin for electrical parts 日立能源瑞士股份公司 2022-02-25 CN claimed
EP-3728490-B1 SOLDER MASK INKJET INKS FOR MANUFACTURING PRINTED CIRCUIT BOARDS AGFA GEVAERT NV (BE) 2022-02-09 EP claimed
US-11111417-B2 Adhesives for assembling components of inert material SICPA HOLDING SA (CH) 2021-09-07 US claimed
WO-2021151707-A1 PHOTO RADIATION CURABLE EPOXY FOR ELECTRICAL COMPONENTS ABB POWER GRIDS SWITZERLAND AG (CH) 2021-08-05 WO claimed
US-8263725-B2 Curable composition KANEKA CORPORATION (JP) 2012-09-11 US claimed
US-20100222525-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2010-09-02 US claimed
US-7754785-B2 Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion TOSHIBA TEC KABUSHIKI KAISHA (JP) 2010-07-13 US claimed
US-7439281-B2 Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion TOSHIBA TEC KABUSHIKI KAISHA (JP) 2008-10-21 US claimed
US-20080242773-A1 Pigment dispersion, precursor of ink for uv-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion RISO TECHNOLOGIES CORPORATION (JP) 2008-10-02 US claimed
EP-1967540-A1 CURABLE COMPOSITION Kaneka Corporation (JP) 2008-09-10 EP claimed
US-20050090582-A1 Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion RISO TECHNOLOGIES CORPORATION (JP) 2005-04-28 US claimed
US-6866376-B2 Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink BROTHER KOGYO KABUSHIKI KAISHA (JP) 2005-03-15 US claimed
US-20030094738-A1 Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink BROTHER KOGYO KABUSHIKI KAISHA (JP) 2003-05-22 US claimed
EP-1302499-A2 Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink BROTHER KOGYO KABUSHIKI KAISHA (JP) 2003-04-16 EP claimed