Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 12/20 | 0.52 |
| ▸ | CA1 | P00915 | 11/20 | 0.52 |
| ▸ | CA12 | O43570 | 6/20 | 0.50 |
| ▸ | CA7 | P43166 | 6/20 | 0.50 |
| ▸ | CA13 | Q8N1Q1 | 6/20 | 0.50 |
| ▸ | MMP1 | P03956 | 1/20 | 0.50 |
| ▸ | MMP2 | P08253 | 1/20 | 0.50 |
| ▸ | MMP9 | P14780 | 1/20 | 0.50 |
| ▸ | MMP8 | P22894 | 1/20 | 0.50 |
| ▸ | MMP13 | P45452 | 1/20 | 0.50 |
| ▸ | F2 | P00734 | 3/20 | 0.44 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.44 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.44 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 3/20 | 0.34 |
| ▸ | CA5A | P35218 | 3/20 | 0.34 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.34 |
| ▸ | CA3 | P07451 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2863229 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| SCHEMBL2474824 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| SCHEMBL21522549 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| SCHEMBL3168827 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| SCHEMBL21522547 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| SCHEMBL2868098 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| SCHEMBL21522351 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| Ammonia Solution, Strong SCHEMBL21384843 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| SCHEMBL2862752 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 | |
| Hydrochloric Acid SCHEMBL9466805 | 0.97 | CA2 (0.50) | CA2CA1CA12CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5189 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| CN-119954991-A | High oxygen permeability ionomer with large steric hindrance group, and preparation method and application thereof | 武汉大学 | 2025-05-09 | — | — | CN | claimed |
| CN-119253096-A | Positive electrode lithium supplementing composite material with core-shell structure and preparation method and application thereof | 中国科学院苏州纳米技术与纳米仿生研究所 | 2025-01-03 | — | — | CN | claimed |
| CN-119220185-A | Adhesive composition and film | 藤森工业株式会社 | 2024-12-31 | — | — | CN | claimed |
| CN-113692668-B | Electrolyte solution for lithium secondary battery and lithium secondary battery comprising same | 株式会社LG新能源 | 2024-07-02 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| CN-117750799-A | Ink, serial electroluminescent device and preparation method thereof | 广东聚华印刷显示技术有限公司 | 2024-03-22 | — | — | CN | claimed |
| CN-114805298-B | Method for preparing thiolactide | 中国科学院长春应用化学研究所 | 2024-02-09 | — | — | CN | claimed |
| US-5854299-A | Process for the polymerization of cyclic olefins and polymerizable composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 1998-12-29 | — | — | US | claimed |
| US-5847179-A | High purity alkoxytrimethylsilane fluids | PCR, INC. (US) | 1998-12-08 | — | — | US | claimed |
| US-5824824-A | AROMATIC SULFONATE ANIONS AND DISSOLUTION CONTRAST IN EXPOSED AND NONEXPOSED AREAS, POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-10-20 | — | — | US | claimed |
| EP-0722468-A1 | PROCESS FOR THE POLYMERIZATION OF CYCLIC OLEFINS AND A POLYMERIZABLE COMPOSITION | Ciba SC Holding AG (CH) | 1996-07-24 | — | — | EP | claimed |
| US-5500668-A | INK JET PRINTING | XEROX CORPORATION (US) | 1996-03-19 | — | — | US | claimed |
| WO-1995007310-A1 | PROCESS FOR THE POLYMERIZATION OF CYCLIC OLEFINS AND A POLYMERIZABLE COMPOSITION | CIBA-GEIGY AG (CH) | 1995-03-16 | — | — | WO | claimed |
| US-5371259-A | Photoinitiators | CIBA-GEIGY CORPORATION (US) | 1994-12-06 | — | — | US | claimed |
| EP-0294333-B1 | COMPOSITION FOR CATIONIC POLYMERISATION WITH HARDENING AGENTS THEREFOR | CIBA-GEIGY AG (CH) | 1993-03-17 | — | — | EP | claimed |
| US-4957946-A | FERROCENE TYPE COMPLEXES, EPOXY RESINS, VINYL ETHERS AND VINYL ESTERS | CIGA-GEIGY CORPORATION (US) | 1990-09-18 | — | — | US | claimed |
| EP-0294333-A2 | Composition for cationic polymerisation with hardening agents therefor | CIBA-GEIGY AG (CH) | 1988-12-07 | — | — | EP | claimed |