SCHEMBL36310

SCHEMBL36310

[O]C1(C(=O)O)CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 2/20 0.44
FFAR3 O14843 1/20 0.36
TSHR P16473 2/20 0.36
AKR1C1 Q04828 1/20 0.36
USP2 O75604 1/20 0.36
ALDH1A1 P00352 1/20 0.36
LMNA P02545 1/20 0.36
CYP1A2 P05177 1/20 0.36
BLM P54132 1/20 0.36
CACNA2D1 P54289 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 1/20 0.31
HDAC4 P56524 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11006083 0.97 CYP2C19 (0.42) CYP2C19FFAR3TSHRAKR1C1USP2
SCHEMBL7677084 0.97
SCHEMBL4867393 0.90
SCHEMBL198365 0.83
SCHEMBL518477 0.71 CYP2C19 (0.46) CYP2C19FFAR3TSHRAKR1C1USP2
SCHEMBL10749636 0.71 CYP2C19 (0.46) CYP2C19FFAR3TSHRAKR1C1USP2
SCHEMBL16819028 0.71 CYP2C19 (0.46) CYP2C19FFAR3TSHRAKR1C1USP2
SCHEMBL20679048 0.71 CYP2C19 (0.46) CYP2C19FFAR3TSHRAKR1C1USP2
SCHEMBL517831 0.71 CYP2C19 (0.46) CYP2C19FFAR3TSHRAKR1C1USP2
SCHEMBL5509416 0.71 CYP2C19 (0.46) CYP2C19FFAR3TSHRAKR1C1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2118 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4225557-A1 METHOD AND KIT FOR NON-DESTRUCTIVE IN SITU REPAIR (RELINING) OF DETERIORATED PIPELINES Applied Resin S.L. (ES) 2023-08-16 EP claimed
CN-112143284-B Radiation-curable ink and use thereof 常州强力电子新材料股份有限公司 2022-09-27 CN claimed
EP-3963605-A1 IMPREGNATING FORMULATION, INSULATION MATERIAL, METHOD FOR PRODUCING AN INSULATION MATERIAL, AND ELECTRICAL MACHINE WITH AN INSULATION MATERIAL Siemens Aktiengesellschaft (DE) 2022-03-09 EP claimed
EP-3921357-A1 CASTING RESIN, SHAPED ARTICLE MADE THEREOF, AND USE OF THE SHAPED ARTICLE Siemens Aktiengesellschaft (DE) 2021-12-15 EP claimed
WO-2020259963-A1 IMPREGNATING FORMULATION, INSULATION MATERIAL, METHOD FOR PRODUCING AN INSULATION MATERIAL, AND ELECTRICAL MACHINE WITH AN INSULATION MATERIAL SIEMENS AKTIENGESELLSCHAFT (DE) 2020-12-30 WO claimed
CN-108138014-B Flexible pressure sensitive adhesive tape for structural bonding 德莎欧洲股份公司 2020-11-24 CN claimed
WO-2020193109-A1 CASTING RESIN, SHAPED ARTICLE MADE THEREOF, AND USE OF THE SHAPED ARTICLE SIEMENS AKTIENGESELLSCHAFT (DE) 2020-10-01 WO claimed
CN-109476963-B Pressure sensitive adhesive strip 德莎欧洲股份公司 2020-04-14 CN claimed
CN-105505526-B Phosphate hydraulic fluid hydrolysis stability reinforcing agent and phosphate hydraulic fluid composition containing same 中国石油化工股份有限公司 2020-03-31 CN claimed
CN-107286878-B Pressure sensitive adhesive 德莎欧洲股份公司 2020-01-07 CN claimed
EP-0119425-B1 PHOTOCOPOLYMERIZABLE COMPOSITIONS BASED ON EPOXIDES,POLYOLS CONTAINING ORGANIC MATERIALS AND A SUBSTITUTED CYCLOALIPHATIC MONOEPOXIDE REACTIVE DILUENT UNION CARBIDE CORPORATION (US) 1990-01-24 EP claimed
EP-0182066-B1 SEALING COMPOUND FOR ELECTRICAL OR ELECTRONIC CONSTRUCTION PARTS OR GROUPS SIEMENS AKTIENGESELLSCHAFT (DE) 1988-09-14 EP claimed
US-4756787-A Cationically polymerizing material, dioxane complex metal salt of a non-nucleophilic anion, latent curing component LOCTITE CORPORATION (US) 1988-07-12 US claimed
US-4717440-A TWO-PART-EACH CONTAINING MONOMER AND LATENT CURING AGENT LOCTITE CORPORATION (US) 1988-01-05 US claimed
EP-0171356-B1 METHOD FOR POLYMERIZING CATIONICALLY POLYMERIZABLE COMPOUNDS CIBA-GEIGY AG (CH) 1987-11-04 EP claimed
EP-0123912-B1 BLENDS OF CYCLIC VINYL ETHER CONTAINING COMPOUNDS AND EPOXIDES UNION CARBIDE CORPORATION (US) 1987-09-09 EP claimed
US-4632859-A Reinforced silicone modified epoxy tape backing THE KENDALL COMPANY (US) 1986-12-30 US claimed
EP-0126494-B1 IMPACT RESISTANT MATRIX RESINS FOR ADVANCED COMPOSITES AMOCO CORPORATION (US) 1986-07-09 EP claimed
EP-0057878-B1 COATING SUBSTRATES WITH HIGH SOLIDS COMPOSITIONS UNION CARBIDE CORPORATION (US) 1985-04-17 EP claimed
US-4394403-A AROMATIC IODONIUM SALT OF COMPLEX ION AS PHOTOINITIATOR MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-07-19 US claimed