SCHEMBL3640293

SCHEMBL3640293

CCOC(F)(C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28261224 1.00 LMNA (0.32) LMNA
SCHEMBL3640294 1.00 LMNA (0.32) LMNA
SCHEMBL25348691 1.00 LMNA (0.32) LMNA
SCHEMBL25348112 1.00 LMNA (0.32) LMNA
SCHEMBL3273446 0.92 LMNA (0.33) LMNA
SCHEMBL1305007 0.92
SCHEMBL22206430 0.90
SCHEMBL12980726 0.86
SCHEMBL15496637 0.84
SCHEMBL292039 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2162795-A1 SOLVENT-ASSISTED LAYER FORMATION FOR IMPRINT LITHOGRAPHY MOLECULAR IMPRINTS, INC. (US) 2010-03-17 EP disclosed
WO-2008156750-A1 SOLVENT-ASSISTED LAYER FORMATION FOR IMPRINT LITHOGRAPHY MOLECULAR IMPRINTS, INC. (US) 2008-12-24 WO disclosed