SCHEMBL3645152

SCHEMBL3645152

Cc1cc(C(C)(c2ccc(Cc3ccc(O)cc3)cc2)c2ccc(O)c(C)c2)ccc1O

nearest known ligand 0.62

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 17/20 0.62
ESR2 Q92731 11/20 0.62
MEN1 O00255 1/20 0.51
KMT2A Q03164 1/20 0.51
AR P10275 3/20 0.49
BACE1 P56817 1/20 0.41
ESRRG P62508 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5031065 0.89 ESR1 (0.75) ESR1ESR2MEN1KMT2AAR
SCHEMBL3645147 0.88 ESR1 (0.54) ESR1ESR2MEN1KMT2AAR
SCHEMBL5617929 0.88 ESR1 (0.69) ESR1ESR2ARESRRG
SCHEMBL3649608 0.86 MEN1 (0.66) ESR1ESR2MEN1KMT2AAR
SCHEMBL3642312 0.85 MEN1 (0.53) ESR1ESR2MEN1KMT2AAR
SCHEMBL12005784 0.84 ESR1 (0.68) ESR1ESR2MEN1KMT2AAR
SCHEMBL3646850 0.84 ESR1 (0.68) ESR1ESR2MEN1KMT2AAR
SCHEMBL12004569 0.84 ESR1 (0.68) ESR1ESR2MEN1KMT2AAR
SCHEMBL20198395 0.84 ESR1 (0.68) ESR1ESR2MEN1KMT2AAR
Bisphenol A SCHEMBL8027398 0.83 ESR1 (0.67) ESR1ESR2ARESRRG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP claimed
WO-2009040661-A2 THICK FILM RESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-04-02 WO claimed
US-20090081589-A1 THICK FILM RESISTS MERCK PATENT GMBH (DE) 2009-03-26 US claimed
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP claimed
EP-1614005-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-01-11 EP claimed
US-6905809-B2 Photoresist compositions CLARIANT FINANCE (BVI) LIMITED (VG) 2005-06-14 US claimed
WO-2004088424-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US claimed
EP-2203783-B1 THICK FILM RESISTS MERCK PATENT GMBH (DE) 2019-11-13 EP disclosed
US-8715918-B2 Thick film resists AZ ELECTRONIC MATERIALS USA CORP. (US) 2014-05-06 US disclosed
EP-2203783-A2 THICK FILM RESISTS AZ Electronic Materials USA Corp. (US) 2010-07-07 EP disclosed
EP-2183292-A2 ANTIREFLECTIVE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2010-05-12 EP disclosed
WO-2004088424-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO disclosed
US-20040197696-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US disclosed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US disclosed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US disclosed
EP-0443820-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-08-28 EP disclosed