SCHEMBL3645535

SCHEMBL3645535

CC(Oc1ccccn1)Oc1ccccn1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.44
LMNA P02545 3/20 0.44
CCR1 P32246 2/20 0.44
CCR5 P51681 2/20 0.44
CCR8 P51685 2/20 0.44
CYP1A2 P05177 2/20 0.44
POLB P06746 1/20 0.44
METAP1 P53582 1/20 0.44
BLM P54132 1/20 0.44
HIF1A Q16665 1/20 0.44
DOHH Q9BU89 1/20 0.44
P4HTM Q9NXG6 1/20 0.44
NPC1 O15118 4/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
RAB9A P51151 3/20 0.40
TP53 P04637 2/20 0.38
ALOX15 P16050 2/20 0.38
HTT P42858 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
ALDH1A1 P00352 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23701489 0.91 KDM4E (0.41) KDM4ELMNACCR1CCR5CCR8
SCHEMBL29388428 0.86 KDM4E (0.44) KDM4ELMNACCR1CCR5CCR8
SCHEMBL826368 0.86 KDM4E (0.44) KDM4ELMNACCR1CCR5CCR8
SCHEMBL8075638 0.84 LTA4H (0.41) KDM4ELMNAPOLBSMN1; SMN2L3MBTL1
SCHEMBL5281969 0.83 SMN1; SMN2 (0.41) KDM4ELMNACCR1CCR5CCR8
SCHEMBL20995459 0.83 KDM4E (0.41) KDM4ELMNACCR1CCR5CCR8
SCHEMBL11001241 0.83 SMN1; SMN2 (0.41) KDM4ELMNACCR1CCR5CCR8
SCHEMBL4632146 0.83 KDM4E (0.41) KDM4ELMNACCR1CCR5CCR8
SCHEMBL2307870 0.83 KDM4E (0.41) KDM4ELMNACCR1CCR5CCR8
SCHEMBL12846287 0.83 KDM4E (0.41) KDM4ELMNACCR1CCR5CCR8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2197924-A2 POLYMERS FOR USE IN PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2010-06-23 EP disclosed
WO-2009027794-A2 POLYMERS FOR USE IN PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-03-05 WO disclosed