Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SERPINE1 | P05121 | 5/20 | 0.86 |
| ▸ | SYNJ2 | O15056 | 1/20 | 0.57 |
| ▸ | DYRK1A | Q13627 | 6/20 | 0.55 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.55 |
| ▸ | PRKCG | P05129 | 1/20 | 0.55 |
| ▸ | PRKCB | P05771 | 1/20 | 0.55 |
| ▸ | PRKCA | P17252 | 1/20 | 0.55 |
| ▸ | PRKCH | P24723 | 1/20 | 0.55 |
| ▸ | PRKCI | P41743 | 1/20 | 0.55 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.55 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.55 |
| ▸ | PRKCZ | Q05513 | 1/20 | 0.55 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.55 |
| ▸ | PRKD1 | Q15139 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.53 |
| ▸ | POLB | P06746 | 2/20 | 0.53 |
| ▸ | GAA | P10253 | 2/20 | 0.53 |
| ▸ | FUT7 | Q11130 | 2/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2789163 | 0.92 | SERPINE1 (1.00) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL15069951 | 0.92 | SERPINE1 (1.00) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL2790213 | 0.92 | SERPINE1 (1.00) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL15052516 | 0.92 | SERPINE1 (0.93) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL10016123 | 0.85 | SERPINE1 (0.84) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL12120882 | 0.85 | SERPINE1 (0.84) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL13286821 | 0.84 | SERPINE1 (1.00) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL13286802 | 0.84 | SERPINE1 (1.00) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL10016129 | 0.84 | SERPINE1 (0.82) | SERPINE1SYNJ2DYRK1APRKD3PRKCG | |
| SCHEMBL8896460 | 0.82 | SERPINE1 (0.59) | SERPINE1SYNJ2DYRK1AKDM4ETDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1877865-B1 | NANOCOMPOSITE PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | MERCK PATENT GMBH (DE) | 2019-11-13 | — | — | EP | disclosed |
| EP-2203783-B1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2019-11-13 | — | — | EP | disclosed |
| US-8715918-B2 | Thick film resists | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-05-06 | — | — | US | disclosed |
| WO-2013064892-A2 | NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONICS MATERIALS USA CORP. (US) | 2013-05-10 | — | — | WO | disclosed |
| US-20130108956-A1 | NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-05-02 | — | — | US | disclosed |
| EP-1497697-B1 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-08-08 | — | — | EP | disclosed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | disclosed |
| US-7524606-B2 | Nanocomposite photoresist composition for imaging thick films | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-28 | — | — | US | disclosed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | disclosed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | disclosed |
| US-20030194636-A1 | Novolak resin or polyhydroxystyrene; photoactive compound or photoacid generator | MERCK PATENT GMBH (DE) | 2003-10-16 | — | — | US | disclosed |
| WO-2003085455-A2 | PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS | CLARIANT INTERNATIONAL LTD (CH) | 2003-10-16 | — | — | WO | disclosed |
| EP-1064313-A4 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | ARCH SPEC CHEM INC (US) | 2001-06-13 | — | — | EP | disclosed |
| EP-1064313-A1 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-01-03 | — | — | EP | disclosed |
| US-5985507-A | PHOTORESISTS WITH THERMAL PROPERTIES | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-11-16 | — | — | US | disclosed |
| WO-1999042507-A1 | SELECTED HIGH THERMAL NOVOLAKS AND POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-08-26 | — | — | WO | disclosed |
| EP-0684521-B1 | Positive working photosensitive compositions | FUJI PHOTO FILM CO LTD (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5674657-A | PHENOLIC RESIN COPOLYMER COMPRISING META-CRESOL, PARA-CRESOL AND OTHER PHENOLIC MONOMER SELECTED FROM XYLENOLS, METHOXYPHENOLS; RADIATION SENSITIVITY | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1997-10-07 | — | — | US | disclosed |
| US-5620828-A | Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator | FUJI PHOTO FILM CO., LTD. (JP) | 1997-04-15 | — | — | US | disclosed |
| US-5534382-A | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-09 | — | — | US | disclosed |