SCHEMBL3661967

SCHEMBL3661967

C=CC(=O)C=C(c1ccccc1O)c1ccccc1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.48
HPGD P15428 7/20 0.48
ALDH1A1 P00352 4/20 0.48
SMN1; SMN2 Q16637 4/20 0.48
CA1 P00915 2/20 0.48
CA9 Q16790 2/20 0.48
CA12 O43570 1/20 0.48
CA2 P00918 1/20 0.48
HMGB1 P09429 1/20 0.48
CA4 P22748 1/20 0.48
CA6 P23280 1/20 0.48
CA7 P43166 1/20 0.48
NAPRT Q6XQN6 1/20 0.48
CA14 Q9ULX7 1/20 0.48
MAPT P10636 4/20 0.47
HSD17B10 Q99714 3/20 0.47
TSHR P16473 2/20 0.47
CYP3A4 P08684 2/20 0.46
MAOB P27338 2/20 0.45
GAA P10253 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28431258 0.84 HSP90AA1 (0.44) KDM4EHPGDALDH1A1SMN1; SMN2CA1
SCHEMBL9315349 0.77 MAPT (0.55) KDM4EHPGDALDH1A1SMN1; SMN2CA1
SCHEMBL16502 0.75 AKT1 (0.56) KDM4EHPGDALDH1A1SMN1; SMN2CA1
SCHEMBL6257711 0.74 CA12 (0.53) HPGDALDH1A1SMN1; SMN2CA1CA9
Salicylic Acid SCHEMBL11396302 0.73 HPGD (0.75) KDM4EHPGDALDH1A1SMN1; SMN2CA1
SCHEMBL7134762 0.72 KDM4E (0.46) KDM4EHPGDALDH1A1SMN1; SMN2CA1
Salicylic Acid SCHEMBL2987530 0.71 ALDH1A1 (0.78) KDM4EHPGDALDH1A1SMN1; SMN2CA1
Salicylic Acid SCHEMBL17938277 0.71 KDM4E (0.70) KDM4EHPGDALDH1A1SMN1; SMN2CA1
Salicylamide SCHEMBL29082500 0.69 KDM4E (0.79) KDM4EHPGDALDH1A1SMN1; SMN2CA1
Salicylic Acid SCHEMBL28128382 0.69 ALDH1A1 (0.75) KDM4EHPGDALDH1A1SMN1; SMN2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0371924-A2 Process for making a pattern CIBA-GEIGY AG (CH) 1990-06-06 EP claimed
EP-2219600-A1 TOPICAL COSMETIC SKIN LIGHTENING COMPOSITIONS AND METHODS OF USE THEREOF STIEFEL LABORATORIES, INC. (US) 2010-08-25 EP disclosed
WO-2009067095-A1 TOPICAL COSMETIC SKIN LIGHTENING COMPOSITIONS AND METHODS OF USE THEREOF STIEFEL LABORATORIES, INC. (US) 2009-05-28 WO disclosed
US-5073478-A METHOD OF MAKING A PATTERN CIBA-GEIGY CORPORATION (US) 1991-12-17 US disclosed
EP-0371924-A2 Process for making a pattern CIBA-GEIGY AG (CH) 1990-06-06 EP disclosed