Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA3 | P07451 | 2/20 | 0.41 |
| ▸ | CA6 | P23280 | 2/20 | 0.41 |
| ▸ | CA5A | P35218 | 2/20 | 0.41 |
| ▸ | CA7 | P43166 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.41 |
| ▸ | TYR | P14679 | 1/20 | 0.41 |
| ▸ | DRD1 | P21728 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Aminobenzoic Acid SCHEMBL53110 | 1.00 | TSHR (0.48) | TSHRTP53MAPTSRD5A2CA1 | |
| Aminobenzoic Acid SCHEMBL18092768 | 0.98 | TSHR (0.46) | TSHRTP53MAPTSRD5A2CA1 | |
| Aminobenzoic Acid SCHEMBL3741434 | 0.92 | TSHR (0.52) | TSHRTP53MAPTSRD5A2CA1 | |
| Aminobenzoic Acid SCHEMBL3286912 | 0.90 | TSHR (0.55) | TSHRTP53MAPTSRD5A2CA1 | |
| Aminobenzoic Acid SCHEMBL3658332 | 0.90 | TSHR (0.55) | TSHRTP53MAPTSRD5A2CA1 | |
| Terephthalic Acid SCHEMBL3249925 | 0.89 | TSHR (0.60) | TSHRTP53MAPTSRD5A2CA1 | |
| Terephthalic Acid SCHEMBL27839875 | 0.89 | TSHR (0.60) | TSHRTP53MAPTSRD5A2CA1 | |
| Terephthalic Acid SCHEMBL10970615 | 0.87 | TSHR (0.57) | TSHRTP53MAPTSRD5A2CA1 | |
| Aminobenzoic Acid SCHEMBL28301611 | 0.85 | TSHR (0.67) | TSHRTP53MAPTSRD5A2CA1 | |
| Aminobenzoic Acid SCHEMBL28080315 | 0.83 | MAPT (0.44) | TSHRTP53MAPTSRD5A2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9827646-B2 | Polishing pad and preparing method thereof | FNS TECH CO., LTD. (KR) | 2017-11-28 | — | — | US | claimed |
| US-20170129072-A1 | Porous Polishing Pad and Preparing Method of the Same | FNS TECH CO., LTD. (KR) | 2017-05-11 | — | — | US | claimed |
| US-20160339559-A1 | POLISHING PAD AND PREPARING METHOD THEREOF | FNS Tech. Co., Ltd. (KR) | 2016-11-24 | — | — | US | claimed |
| US-8551201-B2 | Polyurethane composition for CMP pads and method of manufacturing same | PRAXAIR S.T. TECHNOLOGY, INC. (US) | 2013-10-08 | — | — | US | claimed |
| US-8431489-B2 | Chemical mechanical polishing pad having a low defect window | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2013-04-30 | — | — | US | claimed |
| US-20120295442-A1 | Chemical mechanical polishing pad having a low defect window | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2012-11-22 | — | — | US | claimed |
| US-8257544-B2 | Chemical mechanical polishing pad having a low defect integral window | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2012-09-04 | — | — | US | claimed |
| EP-4395958-A1 | TEXTURED CMP PAD COMPRISING POLYMER PARTICLES | CMC Materials LLC (US) | 2024-07-10 | — | — | EP | disclosed |
| CN-117999150-A | Textured CMP pad comprising polymer particles | CMC材料有限责任公司 | 2024-05-07 | — | — | CN | disclosed |
| CN-117381658-A | Chemical mechanical planarization pad having polishing layer with multi-lobed embedded features | 罗门哈斯电子材料CMP控股股份有限公司 | 2024-01-12 | — | — | CN | disclosed |
| US-20240009798-A1 | Chemical Mechanical Planarization Pad Having Polishing Layer with Multi-lobed Embedded Features | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-11 | — | — | US | disclosed |
| US-11845156-B2 | Polishing pad employing polyamine and cyclohexanedimethanol curatives | CMC MATERIALS, INC. (US) | 2023-12-19 | — | — | US | disclosed |
| CN-117207058-A | CMP pad having low specific gravity polishing layer | 罗门哈斯电子材料CMP控股股份有限公司 | 2023-12-12 | — | — | CN | disclosed |
| US-20080153395-A1 | Chemical mechanical polishing pad | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2008-06-26 | — | — | US | disclosed |
| US-7371160-B1 | Elastomer-modified chemical mechanical polishing pad | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC. (US) | 2008-05-13 | — | — | US | disclosed |
| US-20070275226-A1 | Chemical mechanical polishing pad | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2007-11-29 | — | — | US | disclosed |
| US-20070031753-A1 | Polyurethane member for use in electrophotographic apparatus | HOKUSHIN CORPORATION | 2007-02-08 | — | — | US | disclosed |
| US-7169030-B1 | Chemical mechanical polishing pad | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2007-01-30 | — | — | US | disclosed |
| US-20050171225-A1 | Polyurethane polishing pad | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2005-08-04 | — | — | US | disclosed |
| US-20050171224-A1 | Polyurethane polishing pad | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2005-08-04 | — | — | US | disclosed |