SCHEMBL3672565

SCHEMBL3672565

CC(=O)OC1CC=CCCC1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 7/20 0.33
CHRM1 P11229 5/20 0.33
CHRM4 P08173 4/20 0.33
CHRM3 P20309 4/20 0.33
CHRM5 P08912 2/20 0.33
MEN1 O00255 1/20 0.32
CYP2D6 P10635 1/20 0.32
KMT2A Q03164 1/20 0.32
EPHX1 P07099 1/20 0.32
TSHR P16473 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
LMNA P02545 1/20 0.31
TP53 P04637 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
ALDH1A1 P00352 1/20 0.31
ALOX15 P16050 1/20 0.30
CYP17A1 P05093 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27286963 0.98 SMN1; SMN2 (0.33) CHRM2CHRM1CHRM4CHRM3CHRM5
Hydrochloric Acid SCHEMBL27298817 0.98 SMN1; SMN2 (0.33) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL3678399 0.94 EPHX1 (0.34) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL3678402 0.94 EPHX1 (0.34) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL28114860 0.90 TSHR (0.35) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL7640695 0.90 TSHR (0.35) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL28115386 0.90 TSHR (0.35) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL24884685 0.86 EPHX1 (0.36) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL868024 0.86 EPHX1 (0.36) CHRM2CHRM1CHRM4CHRM3CHRM5
SCHEMBL20839586 0.86 EPHX1 (0.36) CHRM2CHRM1CHRM4CHRM3CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7723423-B2 Gas-barrier resin composition CRYOVAC, INC. (US) 2010-05-25 US disclosed
EP-1746131-B1 Gas-barrier resin composition CRYOVAC INC (US) 2009-01-21 EP disclosed
US-7285598-B2 Polymer and process for producing the same KURARAY CO., LTD. (JP) 2007-10-23 US disclosed
US-20070093599-A1 Gas-barrier resin composition CRYOVAC, INC. (US) 2007-04-26 US disclosed
US-20070021556-A1 Gas-barrier resin composition KURARAY CO. LTD. (JP) 2007-01-25 US disclosed
EP-1746131-A2 Gas-barrier resin composition Cryovac, Inc. (US) 2007-01-24 EP disclosed
US-20060149009-A1 Produced by ring-opening, in the presence of a metal alkylidene complex comprising a ligand with an imidazolidine structure, a cyclic olefin comprising at least one cyclic olefin further comprising a hydroxy group or a functional group that can be converted into a hydroxy group, and hydrogenating KURARAY CO., LTD. (JP) 2006-07-06 US disclosed
EP-1598384-A1 NOVEL POLYMER AND PROCESS FOR PRODUCING THE SAME KURARAY CO., LTD. (JP) 2005-11-23 EP disclosed
CN-1008737-B Process for preparing benzo [1] oxy [5] thiacycloheptene derivatives TAKEDA CHEMICAL INDUSTRIES LTD (JP) 1990-07-11 CN disclosed
CN-85104426-A Benzo [ 1 ] oxy [ 5 ] thiacycloheptene derivatives, their production and use 1986-04-10 CN disclosed