SCHEMBL36727

SCHEMBL36727

CCCCCC(S)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10959492 0.97 TSHR (0.44)
SCHEMBL1123306 0.97 TSHR (0.44)
SCHEMBL1123635 0.97 TSHR (0.44)
SCHEMBL9732346 0.97 TSHR (0.44)
SCHEMBL1123381 0.97 TSHR (0.44)
SCHEMBL4572540 0.97 TSHR (0.44)
SCHEMBL11042203 0.97 TSHR (0.44)
SCHEMBL10696337 0.97 OPRM1 (0.42)
SCHEMBL1901863 0.97 TSHR (0.44)
SCHEMBL27563773 0.97 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250040296-A1 SEMICONDUCTOR NANOPARTICLE, PRODUCTION METHOD THEREOF, AND ELECTROLUMINESCENT DEVICE AND DISPLAY DEVICE INCLUDING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2025-01-30 US claimed
EP-4497801-A1 SEMICONDUCTOR NANOPARTICLE, PRODUCTION METHOD THEREOF, AND ELECTROLUMINESCENT DEVICE AND DISPLAY DEVICE INCLUDING THE SAME Samsung Electronics Co., Ltd. (KR) 2025-01-29 EP claimed
CN-119370883-A Semiconductor nanoparticle, method of preparing the same, and electroluminescent device and display apparatus including the same 三星电子株式会社 2025-01-28 CN claimed
CN-112707984-B 4D printing photosensitive resin based on dynamic covalent bond and preparation method thereof 西安交通大学 2022-04-05 CN claimed
CN-112707984-A 4D printing photosensitive resin based on dynamic covalent bond and preparation method thereof 西安交通大学 2021-04-27 CN claimed
EP-3340283-B1 WAFER WASHING METHOD, AND LIQUID CHEMICAL USED IN SAME CENTRAL GLASS CO LTD (JP) 2020-05-20 EP claimed
CN-107241906-A Functionalized elastomers, process for their preparation and their use SABIC环球技术有限责任公司 2017-10-10 CN claimed
EP-2049574-B1 USE OF A SULFUR COMPOUND FOR PREPARING HALOGEN-FREE ATRP PRODUCTS EVONIK ROEHM GMBH (DE) 2012-09-05 EP claimed
CN-101484479-B Process for preparing halogen-free ATRP products EVONIK ROEHM GMBH 2011-08-17 CN claimed
US-20090275707-A1 PROCESS FOR PREPARING HALOGEN-FREE ATRP PRODUCTS EVONIK ROEHM GMBH (DE) 2009-11-05 US claimed
CN-101484479-A Process for preparing halogen-free ATRP products EVONIK ROEHM GMBH (DE) 2009-07-15 CN claimed
EP-2049574-A1 PROCESS FOR PREPARING HALOGEN-FREE ATRP PRODUCTS Evonik Röhm GmbH (DE) 2009-04-22 EP claimed
WO-2008017523-A1 PROCESS FOR PREPARING HALOGEN-FREE ATRP PRODUCTS EVONIK RÖHM GMBH (DE) 2008-02-14 WO claimed
US-4735711-A ORGANIC MONOSULFIDE THE DOW CHEMICAL COMPANY (US) 1988-04-05 US claimed
EP-4579344-A1 THIOALKYLCOUMARIN PHOTOSENSITIZERS FOR PHOTOPOLYMERIZATION IGM Group B.V. (NL) 2025-07-02 EP disclosed
EP-4578918-A1 PHOTOSENSITIZERS FOR PHOTOPOLYMERIZATION IGM Group B.V. (NL) 2025-07-02 EP disclosed
CN-115066288-B Method for coupling ligands to composite materials 默克密理博有限公司 2025-03-11 CN disclosed
WO-1987000451-A1 NOVEL COLLECTOR COMPOSITION FOR FROTH FLOTATION THE DOW CHEMICAL COMPANY (US) 1987-01-29 WO disclosed
WO-1986006983-A1 NOVEL COLLECTORS FOR THE SELECTIVE FROTH FLOTATION OF SULFIDE MINERALS THE DOW CHEMICAL COMPANY (US) 1986-12-04 WO disclosed
US-4242482-A BULK OR SUSPENSION POLYMERIZATION USING STANNOUS OR ANTIMONY(III) MERCAPTIDES DART INDUSTRIES INC. (US) 1980-12-30 US disclosed