Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.38 |
| ▸ | RXFP1 | Q9HBX9 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | PDE7A | Q13946 | 2/20 | 0.38 |
| ▸ | PDE7B | Q9NP56 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | PARP1 | P09874 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9208204 | 0.98 | ALDH1A1 (0.38) | ALDH1A1KDM4EHPGDTSHRNPSR1 | |
| SCHEMBL9557286 | 0.80 | APOBEC3G (0.41) | ALDH1A1KDM4EHPGDNPSR1MEN1 | |
| SCHEMBL1250161 | 0.80 | KDM4E (0.46) | ALDH1A1KDM4EHPGDRXFP1CYP2C19 | |
| SCHEMBL6570236 | 0.80 | MAPT (0.36) | ALDH1A1KDM4EHPGDPOLBMEN1 | |
| SCHEMBL10782734 | 0.78 | TSHR (0.44) | ALDH1A1KDM4EHPGDTSHRMEN1 | |
| SCHEMBL12892341 | 0.78 | ALDH1A1 (0.48) | ALDH1A1KDM4EHPGDTSHRPOLB | |
| SCHEMBL1250717 | 0.78 | MEN1 (0.46) | ALDH1A1KDM4EHPGDCYP1A2CYP2C19 | |
| SCHEMBL12892336 | 0.78 | MAPK10 (0.46) | ALDH1A1CYP1A2CYP2C19POLBMEN1 | |
| SCHEMBL29205679 | 0.78 | TSHR (0.40) | ALDH1A1KDM4ETSHRPOLBMEN1 | |
| SCHEMBL12892330 | 0.76 | ALDH1A1 (0.42) | ALDH1A1KDM4ETSHRNPSR1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 408 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12331239-B2 | Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt | BASF SE (DE) | 2025-06-17 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| EP-4419619-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | Entegris, Inc. (US) | 2024-08-28 | — | — | EP | claimed |
| US-11978622-B2 | Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility | ENTEGRIS, INC. (US) | 2024-05-07 | — | — | US | claimed |
| CN-117946686-A | Composition for selectively etching aluminum oxide | 安集微电子科技（上海）股份有限公司 | 2024-04-30 | — | — | CN | claimed |
| WO-2024083020-A1 | COMPOSITION FOR SELECTIVELY ETCHING ALUMINUM OXIDE | 安集微电子科技（上海）股份有限公司 | 2024-04-25 | — | — | WO | claimed |
| US-20240093089-A1 | COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A LAYER COMPRISING AN ALUMINIUM COMPOUND IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER AND/OR COBALT | BASF SE (DE) | 2024-03-21 | — | — | US | claimed |
| WO-2023069409-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | ENTEGRIS, INC. (US) | 2023-04-27 | — | — | WO | claimed |
| US-20230121639-A1 | SELECTIVE WET ETCH COMPOSITION AND METHOD | ENTEGRIS, INC. | 2023-04-20 | — | — | US | claimed |
| EP-4136273-A1 | METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM | Entegris, Inc. (US) | 2023-02-22 | — | — | EP | claimed |
| EP-0406163-A1 | Thioxotetrazolines | CIBA-GEIGY AG (CH) | 1991-01-02 | — | — | EP | claimed |
| EP-0196705-B1 | A METHOD OF EFFECTING HIGH CONTRAST DEVELOPMENT OF A IMAGE-WISE EXPOSED PHOTOGRAPHIC SILVER HALIDE EMULSION LAYER MATERIAL | AGFA-GEVAERT N.V. (BE) | 1988-08-10 | — | — | EP | claimed |
| US-4672043-A | PALLADIUM TETRAMINE SALT, DIMETHYLAMINE BORANE, NICKEL CHLORIDE, TETRAZOLIUM SALT | EASTMAN KODAK COMPANY (US) | 1987-06-09 | — | — | US | claimed |
| EP-0196705-A1 | A method of effecting high contrast development of a image-wise exposed photographic silver halide emulsion layer material | AGFA-GEVAERT N.V. (BE) | 1986-10-08 | — | — | EP | claimed |
| US-4614568-A | USING A CYCLIC THIOUREA COMPOUND TO PREVENT SILVER DEPOSITION BY DISPLACEMENT | NIHON KOGYO KABUSHIKI KAISHA (JP) | 1986-09-30 | — | — | US | claimed |
| EP-0192463-A2 | Stabilization of developed electrophoregrams | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1986-08-27 | — | — | EP | claimed |
| US-4579808-A | ALSO CONTAINING BINDER AND FREE RADICAL PRODUCING COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-04-01 | — | — | US | claimed |
| US-4138265-A | Antifoggants in certain photographic and photothermographic materials that include silver salts of 3-amino-1,2,4-mercaptotriazole | EASTMAN KODAK COMPANY (US) | 1979-02-06 | — | — | US | claimed |
| US-4137079-A | Antifoggants in heat developable photographic materials | EASTMAN KODAK COMPANY (US) | 1979-01-30 | — | — | US | claimed |
| US-4123274-A | SILVER HALIDE, SILVER SALT OF A 3-AMINO-5-ARYL(ALKYL)THIO-1,2,4-TRIAZOLE, DEVELOPER, BINDER; PHOTOTHERMOGRAPHY | EASTMAN KODAK COMPANY (US) | 1978-10-31 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240093089-A1 | COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING A LAYER COMPRISING AN ALUMINIUM COMPOUND IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER AND/OR COBALT | STK11, CRKL, STK10 | ALDH1A1 3964/4885KDM4E 425/4885HPGD 4752/4885 |
| US-12331239-B2 | Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt | STK11, CRKL, STK10 | ALDH1A1 3964/4885KDM4E 425/4885HPGD 4752/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.