Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.37 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.32 |
| ▸ | NSD2 | O96028 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.31 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.31 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3097649 | 0.79 | FFAR3 (0.43) | FFAR3LMNAPKM | |
| Hydrochloric Acid SCHEMBL3142298 | 0.75 | FFAR3 (0.44) | FFAR3NSD2LMNAALKBH5SUCNR1 | |
| Hydrochloric Acid SCHEMBL628949 | 0.75 | FFAR3 (0.44) | FFAR3NSD2LMNAALKBH5SUCNR1 | |
| SCHEMBL204371 | 0.75 | FFAR3 (0.44) | FFAR3NSD2LMNAALKBH5SUCNR1 | |
| SCHEMBL778222 | 0.74 | FFAR3 (0.45) | FFAR3LMNAPKM | |
| SCHEMBL2380339 | 0.73 | FFAR3 (0.38) | FFAR3LMNAPKM | |
| SCHEMBL31084407 | 0.72 | FFAR3 (0.30) | FFAR3 | |
| Hydrochloric Acid SCHEMBL5480359 | 0.72 | GRM1 (0.48) | FFAR3GRM1NSD2PKM | |
| Hydrochloric Acid SCHEMBL8368069 | 0.72 | GRM1 (0.48) | FFAR3GRM1NSD2PKM | |
| SCHEMBL471854 | 0.70 | FFAR3 (0.35) | FFAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5310862-A | Photosensitive polyimide precursor compositions and process for preparing same | TORAY INDUSTRIES, INC. (JP) | 1994-05-10 | — | — | US | claimed |
| US-4305824-A | Cellulose derivative reverse osmosis membrane | TORAY INDUSTRIES, INCORPORATED (JP) | 1981-12-15 | — | — | US | claimed |
| US-4239545-A | Cellulose derivative reverse osmosis membrane and casting solution and additive for preparing the same | TORAY INDUSTRIES, INC. (JP) | 1980-12-16 | — | — | US | claimed |
| JP-59100135-A | — | — | None | — | — | JP | disclosed |
| WO-2023228815-A1 | RESIN COMPOSITION, CURED PRODUCT, ANTENNA ELEMENT AND ELECTRONIC COMPONENT | 東レ株式会社 | 2023-11-30 | — | — | WO | disclosed |
| US-20230112804-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE SHEET, CURED FILM, METHOD FOR PRODUCING CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2023-04-13 | — | — | US | disclosed |
| CN-115210648-A | Photosensitive resin composition, photosensitive sheet, cured film, method for producing cured film, electronic component, antenna element, semiconductor package, and display device | 东丽株式会社 | 2022-10-18 | — | — | CN | disclosed |
| EP-3150655-B1 | POLYIMIDE-BASED LIQUID AND POLYIMIDE-BASED FILM PRODUCED USING SAME | LG CHEMICAL LTD (KR) | 2021-05-05 | — | — | EP | disclosed |
| CN-107722270-B | Polyimide-based liquid and polyimide-based film prepared using the same | 株式会社LG化学 | 2021-04-20 | — | — | CN | disclosed |
| EP-3016090-B1 | METHOD FOR MANUFACTURING AN ORGANIC ELECTRONIC DEVICE | LG CHEMICAL LTD (KR) | 2021-01-27 | — | — | EP | disclosed |
| EP-3266808-B1 | COMPOSITION FOR POLYIMIDE FILM FOR FLEXIBLE SUBSTRATE OF OPTOELECTRONIC DEVICE | LG CHEMICAL LTD (KR) | 2020-12-09 | — | — | EP | disclosed |
| WO-1997036984-A1 | PROCESS FOR AUTOMATICALLY ADJUSTING THE pH OF AN AQUEOUS TREATMENT SOLUTION AND SOLID CLEANING AGENTS SUITABLE THEREFOR | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 1997-10-09 | — | — | WO | disclosed |
| US-5609914-A | APPLYING AN AQUEOUS INK IMAGEWISE TO THE NONPHOTOSENSITIVE LAYER TO CHANGE ITS SOLUBILITY, WASHING TO REMOVE SOLUBLE AREAS OF LAYER AND CURING POLYAMIC ACID TO FORM A POLYIMIDE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-03-11 | — | — | US | disclosed |
| EP-0742487-A1 | Method for preparing high resolution polyimide images using non-photosensitive layers of poly(amic acid) or salts thereof | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-11-13 | — | — | EP | disclosed |
| US-5310862-A | Photosensitive polyimide precursor compositions and process for preparing same | TORAY INDUSTRIES, INC. (JP) | 1994-05-10 | — | — | US | disclosed |
| EP-0531019-A1 | Photosensitive polyimide precursor compositions and process for preparing same | TORAY INDUSTRIES, INC. (JP) | 1993-03-10 | — | — | EP | disclosed |
| US-4611049-A | ORGANOMETALLIC CATALYSTS | TEIJIN LIMITED (JP) | 1986-09-09 | — | — | US | disclosed |
| JP-S59100135-A | RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO LTD | 1984-06-09 | — | — | JP | disclosed |
| US-4305824-A | Cellulose derivative reverse osmosis membrane | TORAY INDUSTRIES, INCORPORATED (JP) | 1981-12-15 | — | — | US | disclosed |
| US-4239545-A | Cellulose derivative reverse osmosis membrane and casting solution and additive for preparing the same | TORAY INDUSTRIES, INC. (JP) | 1980-12-16 | — | — | US | disclosed |