SCHEMBL3675150

SCHEMBL3675150

CCC(O)C#CC(O)CC(C)C

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10794964 0.89 TSHR (0.35) TSHR
SCHEMBL737214 0.83 TSHR (0.44) TSHR
SCHEMBL4531715 0.78
SCHEMBL15353487 0.77 GRIK1 (0.31) TSHR
SCHEMBL11550589 0.76
SCHEMBL11547678 0.76
SCHEMBL5165819 0.76
SCHEMBL23930202 0.74
SCHEMBL15283726 0.71 TSHR (0.39) TSHR
SCHEMBL19384867 0.70 LMNA (0.37) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022239625-A1 INK-JET INK, INK SET, AND IMAGE-RECORDING METHOD 富士フイルム株式会社 2022-11-17 WO disclosed
US-10947400-B2 Inkjet inks HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2021-03-16 US disclosed
US-20190023923-A1 INKJET INKS HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2019-01-24 US disclosed
US-20120214307-A1 CHEMICAL-MECHANICAL POLISHING LIQUID, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND POLISHING METHOD USING SAID POLISHING LIQUID HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-08-23 US disclosed
EP-2183117-A1 INKJET MEDIUM, INK AND INKJET RECORDING METHOD Ricoh Company, Ltd. (JP) 2010-05-12 EP disclosed
WO-2009028733-A1 INKJET MEDIUM, INK AND INKJET RECORDING METHOD RICOH COMPANY, LTD. (JP) 2009-03-05 WO disclosed
WO-2006132427-A1 INK JET INK, METHOD OF PRODUCING INK JET INK, INK JET RECORDING METHOD, INK CARTRIDGE, AND CYAN INK CANON KABUSHIKI KAISHA (JP) 2006-12-14 WO disclosed
EP-1315792-A2 COMPOSITION FOR CLEANING CHEMICAL MECHANICAL PLANARIZATION APPARATUS EKC Technology, INC. (US) 2003-06-04 EP disclosed
EP-0799273-B1 METHOD FOR THE PRODUCTION OF FREE-FLOWING TETRAFLUOROETHYLENE POLYMER MOLDING POWDERS ASAHI GLASS FLUOROPOLYMERS USA (US) 2002-05-02 EP disclosed
WO-2002013242-A2 COMPOSITION FOR CLEANING CHEMICAL MECHANICAL PLANARIZATION APPARATUS EKC TECHNOLOGY, INC. (US) 2002-02-14 WO disclosed
EP-0799273-A2 METHOD FOR THE PRODUCTION OF FREE-FLOWING TETRAFLUOROETHYLENE POLYMER MOLDING POWDERS ICI AMERICAS INC. (US) 1997-10-08 EP disclosed
WO-1996020241-A2 METHOD FOR THE PRODUCTION OF FREE-FLOWING TETRAFLUOROETHYLENE POLYMER MOLDING POWDERS ICI AMERICAS INC. (US) 1996-07-04 WO disclosed
US-5502161-A WETTING AGENT ICI AMERICAS INC. (US) 1996-03-26 US disclosed
US-4777246-A 1-diazo-2-naphthol-4-sulfonic acid by iron-catalyzed diazotization CIBA-GEIGY CORPORATION (US) 1988-10-11 US disclosed