SCHEMBL3675381

SCHEMBL3675381

CC=C[SiH](N(CC)CC)N(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5084626 0.85
SCHEMBL3670136 0.78
SCHEMBL5088463 0.74
SCHEMBL27840179 0.74
SCHEMBL5085518 0.74
SCHEMBL2101425 0.74
SCHEMBL9062897 0.74
SCHEMBL2100483 0.72
SCHEMBL2103949 0.67
SCHEMBL5088397 0.67 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN claimed
CN-114479788-B Water-based drilling fluid composition suitable for high-temperature easily collapsed stratum, water-based drilling fluid, preparation method and application thereof 中国石油化工股份有限公司 2023-03-31 CN claimed
CN-114479788-A Water-based drilling fluid composition suitable for high-temperature easily collapsed stratum, water-based drilling fluid, preparation method and application thereof 中国石油化工股份有限公司 2022-05-13 CN claimed
CN-113383108-A Deposition of carbon-doped silicon oxide 弗萨姆材料美国有限责任公司 2021-09-10 CN claimed
CN-112969816-A Compositions for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2021-06-15 CN claimed
CN-115362185-B Conjugated diene polymer, conjugated diene polymer composition, rubber crosslinked product, and tire 日本瑞翁株式会社 2025-06-24 CN disclosed
US-20250197996-A1 LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NITRIDE LAM RES CORP (US) 2025-06-19 US disclosed
EP-4566837-A1 TIRE Sumitomo Rubber Industries, Ltd. (JP) 2025-06-11 EP disclosed
US-20250179234-A1 RUBBER COMPOSITION FOR HEAVY-LOAD TIRE ZS ELASTOMERS CO., LTD. (JP) 2025-06-05 US disclosed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN disclosed
CN-119604963-A Hybrid atomic layer deposition 朗姆研究公司 2025-03-11 CN disclosed
CN-119487614-A Deposition and etching of silicon-containing layers 朗姆研究公司 2025-02-18 CN disclosed
WO-2019189204-A1 METHOD FOR PRODUCING CONJUGATED DIENE RUBBER 日本ゼオン株式会社 2019-10-03 WO disclosed
US-20190193464-A1 TREAD RUBBER COMPOSITION AND PNEUMATIC TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2019-06-27 US disclosed
EP-2857446-B1 TREAD RUBBER COMPOSITION AND PNEUMATIC TIRE SUMITOMO RUBBER IND (JP) 2018-03-07 EP disclosed
EP-2749592-B1 RUBBER COMPOSITION AND PNEUMATIC TIRE SUMITOMO RUBBER IND (JP) 2016-05-11 EP disclosed
EP-2857446-A1 TREAD RUBBER COMPOSITION AND PNEUMATIC TIRE Sumitomo Rubber Industries, Ltd. (JP) 2015-04-08 EP disclosed
US-8415435-B2 Conjugated diene-based polymer, method for manufacturing the same, and conjugated diene polymer composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-09 US disclosed
US-20100016499-A1 CONJUGATED DIENE-BASED POLYMER, METHOD FOR MANUFACTURING THE SAME, AND CONJUGATED DIENE POLYMER COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-01-21 US disclosed
WO-2008108377-A1 CONJUGATED DIENE-BASED POLYMER, METHOD FOR MANUFACTURING THE SAME, AND CONJUGATED DIENE POLYMER COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-09-12 WO disclosed