⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5085517 | 0.76 | — | — | |
| SCHEMBL3675381 | 0.74 | — | — | |
| SCHEMBL5088877 | 0.72 | — | — | |
| SCHEMBL341543 | 0.69 | — | — | |
| SCHEMBL3383631 | 0.69 | — | — | |
| SCHEMBL5084626 | 0.67 | — | — | |
| SCHEMBL3670136 | 0.65 | — | — | |
| SCHEMBL9062897 | 0.62 | — | — | |
| SCHEMBL521829 | 0.61 | — | — | |
| SCHEMBL27840179 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119900018-A | Composition for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2025-04-29 | — | — | CN | claimed |
| CN-113383108-A | Deposition of carbon-doped silicon oxide | 弗萨姆材料美国有限责任公司 | 2021-09-10 | — | — | CN | claimed |
| CN-112969816-A | Compositions for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-06-15 | — | — | CN | claimed |
| CN-119213530-A | Low-k dielectric protection during plasma deposition of silicon nitride | 朗姆研究公司 | 2024-12-27 | — | — | CN | disclosed |
| CN-119213529-A | Seamless and crack-free deposition | 朗姆研究公司 | 2024-12-27 | — | — | CN | disclosed |
| CN-118900884-A | Rubber composition for heavy-duty tire | 瑞住合成橡胶株式会社 | 2024-11-05 | — | — | CN | disclosed |
| CN-118805241-A | Thermal film deposition | 朗姆研究公司 | 2024-10-18 | — | — | CN | disclosed |
| CN-118742599-A | Rubber composition for sidewall | 瑞住合成橡胶株式会社 | 2024-10-01 | — | — | CN | disclosed |
| CN-118715278-A | Rubber composition for heavy-duty tire | 瑞住合成橡胶株式会社 | 2024-09-27 | — | — | CN | disclosed |
| CN-118696395-A | Conformal silicon oxide deposition using aminosilane and chlorosilane precursors | 朗姆研究公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-118402039-A | Conformal deposition of silicon nitride | 朗姆研究公司 | 2024-07-26 | — | — | CN | disclosed |
| CN-118402040-A | Low temperature molybdenum deposition assisted by silicon-containing reactants | 朗姆研究公司 | 2024-07-26 | — | — | CN | disclosed |
| CN-118355473-A | Conformal carbon-doped silicon nitride films and methods thereof | 朗姆研究公司 | 2024-07-16 | — | — | CN | disclosed |
| CN-109976097-B | Method of forming micropattern and substrate processing apparatus | 三星电子株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-117836904-A | In situ core protection in multiple patterning | 朗姆研究公司 | 2024-04-05 | — | — | CN | disclosed |
| CN-117121173-A | Integration of fully aligned vias by selective deposition and resistivity reduction | 朗姆研究公司 | 2023-11-24 | — | — | CN | disclosed |
| CN-116194306-A | Rubber composition for heavy-duty tire | 瑞住合成橡胶株式会社 | 2023-05-30 | — | — | CN | disclosed |
| CN-113383108-A | Deposition of carbon-doped silicon oxide | 弗萨姆材料美国有限责任公司 | 2021-09-10 | — | — | CN | disclosed |
| CN-112969816-A | Compositions for high temperature atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2021-06-15 | — | — | CN | disclosed |
| WO-2008108377-A1 | CONJUGATED DIENE-BASED POLYMER, METHOD FOR MANUFACTURING THE SAME, AND CONJUGATED DIENE POLYMER COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-12 | — | — | WO | disclosed |