SCHEMBL367609

SCHEMBL367609

C=CC([SiH3])C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28981335 0.70
SCHEMBL1929433 0.69
SCHEMBL10897123 0.69
SCHEMBL68491 0.67
SCHEMBL175049 0.67
SCHEMBL3094040 0.67
SCHEMBL8814616 0.67
SCHEMBL516191 0.67
SCHEMBL175774 0.67
SCHEMBL3297998 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 207 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109867794-B Multi-temperature-zone control method for high-molecular-weight polycarbosilane bridging synthesis 中国人民解放军国防科技大学 2021-06-11 CN claimed
US-20180080234-A1 WATER RESISTANT FLOORING UNDERLAYMENT BELL BANK 2018-03-22 US claimed
EP-2881408-B1 Styrene-based copolymer and thermoplastic resin composition including the same LOTTE ADVANCED MAT CO LTD (KR) 2017-09-20 EP claimed
US-9365671-B2 Styrene-based copolymer and thermoplastic resin composition including the same SAMSUNG SDI CO., LTD. (KR) 2016-06-14 US claimed
EP-2881408-A1 Styrene-based copolymer and thermoplastic resin composition including the same Samsung SDI Co., Ltd. (KR) 2015-06-10 EP claimed
CN-104693334-A Styrene-based copolymer and thermoplastic resin composition including the same SAMSUNG SDI CO LTD 2015-06-10 CN claimed
US-20150152205-A1 Styrene-Based Copolymer and Thermoplastic Resin Composition Including the Same LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2015-06-04 US claimed
US-20120128896-A1 STAIN-RESISTANT CONTAINER AND METHOD THE GLAD PRODUCTS COMPANY 2012-05-24 US claimed
US-20100323127-A1 ATMOSPHERIC PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION PROCESS RHOTON CHRISTINA ANN 2010-12-23 US claimed
US-7521434-B2 Cross-linked gels of hyaluronic acid with hydrophobic polymers and processes for making them LUROMED LLC (US) 2009-04-21 US claimed
US-20030022953-A1 Antireflective porogens SHIPLEY COMPANY, L.L.C. 2003-01-30 US claimed
US-20020198269-A1 Antireflective porogens SHIPLEY COMPANY, L.L.C. 2002-12-26 US claimed
US-20020065331-A1 Antireflective porogens SHIPLEY COMPANY, L.L.C. 2002-05-30 US claimed
EP-1197998-A2 Antireflective porogens Shipley Company LLC (US) 2002-04-17 EP claimed
EP-1172823-A1 Porous materials Shipley Company LLC (US) 2002-01-16 EP claimed
US-6271273-B1 Porous materials SHIPLEY COMPANY, L.L.C. 2001-08-07 US claimed
CN-1151690-A Dental impression material with cure-indicating dye MINNESOTA MINING & MFG (US) 1997-06-11 CN claimed
EP-0441620-B1 Production of alpha-olefin polymers MITSUBISHI CHEM CORP (JP) 1996-01-10 EP claimed
US-5147839-A Solid coordination catalyst containing hydrocarbyloxysilane and vinylalkylsilane components; stereospecific, selective MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1992-09-15 US claimed
EP-0441620-A2 Production of alpha-olefin polymers MITSUBISHI CHEMICAL CORPORATION (JP) 1991-08-14 EP claimed