⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12909785 | 0.90 | — | — | |
| SCHEMBL12909787 | 0.87 | — | — | |
| SCHEMBL18406277 | 0.87 | — | — | |
| SCHEMBL17660004 | 0.80 | — | — | |
| SCHEMBL17718717 | 0.77 | — | — | |
| SCHEMBL41580 | 0.77 | — | — | |
| SCHEMBL3688172 | 0.75 | — | — | |
| SCHEMBL41518 | 0.75 | — | — | |
| SCHEMBL15494003 | 0.72 | — | — | |
| SCHEMBL400325 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111565859-B | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2022-12-30 | — | — | CN | claimed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | claimed |
| CN-111565859-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2020-08-21 | — | — | CN | claimed |
| CN-117980531-A | Silicon precursor materials, silicon-containing films, and related methods | 恩特格里斯公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-115668459-A | Surface treatment method for semiconductor substrate and surface treatment agent composition | 中央硝子株式会社 | 2023-01-31 | — | — | CN | disclosed |
| CN-107847188-B | Composition for latent fingerprint detection | 东亚合成株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | disclosed |
| CN-111565859-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2020-08-21 | — | — | CN | disclosed |
| CN-104364337-B | light-reflective anisotropic conductive adhesive and light-emitting device | 迪睿合电子材料有限公司 | 2016-08-17 | — | — | CN | disclosed |
| CN-102459423-B | Polysiloxane condensation reactants | ASAHI KASEI E MATERIALS CORP | 2015-05-20 | — | — | CN | disclosed |
| CN-104364337-A | Light-reflective anisotropic conductive adhesive and light-emitting device | DEXERIALS CORP | 2015-02-18 | — | — | CN | disclosed |
| US-7737291-B2 | 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition | ADEKA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| EP-2125833-A1 | METHOD FOR THE PRODUCTION OF POLYMERISABLE SILICONES | Wacker Chemie AG (DE) | 2009-12-02 | — | — | EP | disclosed |
| EP-2125834-A1 | METHOD FOR THE PRODUCTION OF POLYMERISABLE SILICONES | Wacker Chemie AG (DE) | 2009-12-02 | — | — | EP | disclosed |
| US-20090186210-A1 | PRECURSOR COMPOSITION FOR POROUS THIN FILM, METHOD FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS THIN FILM, METHOD FOR PREPARATION OF THE POROUS THIN FILM, AND SEMICONDUCTOR DEVICE | ULVAC. INC. (JP) | 2009-07-23 | — | — | US | disclosed |
| EP-2025709-A1 | PRECURSOR COMPOSITION FOR POROUS MEMBRANE, PROCESS FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS MEMBRANE, PROCESS FOR PRODUCTION OF THE POROUS MEMBRANE, AND SEMICONDUCTOR DEVICE | ULVAC, INC. (JP) | 2009-02-18 | — | — | EP | disclosed |
| WO-2008090013-A1 | METHOD FOR THE PRODUCTION OF POLYMERISABLE SILICONES | WACKER CHEMIE AG (DE) | 2008-07-31 | — | — | WO | disclosed |
| WO-2008090012-A1 | METHOD FOR THE PRODUCTION OF POLYMERISABLE SILICONES | WACKER CHEMIE AG (DE) | 2008-07-31 | — | — | WO | disclosed |
| US-20070232821-A1 | Composition Containing Siloxane Compound and Phenol Compound | ADEKA CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| CN-1981069-A | Composition containing siloxane compound and phenol compound | ADEKA CORP (JP) | 2007-06-13 | — | — | CN | disclosed |