SCHEMBL367694

SCHEMBL367694

CC(C)(CO)CBr

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8175429 0.84 ALDH1A1 (0.38)
Ethylene Glycol SCHEMBL11369372 0.79 TSHR (0.37)
SCHEMBL229715 0.76 ALDH1A1 (0.35)
SCHEMBL1975737 0.76
SCHEMBL19621 0.76
SCHEMBL230929 0.74 ALDH1A1 (0.32)
SCHEMBL229748 0.74 ALDH1A1 (0.32)
SCHEMBL11358043 0.73
SCHEMBL1942926 0.73
SCHEMBL9650455 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 573 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122060402-A Radiation-cured wear-resistant paint and preparation method thereof 江苏佳饰家新材料集团股份有限公司 2026-05-19 CN claimed
CN-119081425-A EVA composite anti-shrinkage elastomer with small multiplying power and preparation method thereof 佛山市中科华贸新材料科技有限公司 2024-12-06 CN claimed
CN-112409131-A Synthetic preparation method of 3-bromo-2, 2-dimethyl-1-propanol 南京麦瑞米生物技术有限公司 2021-02-26 CN claimed
CN-106054523-B A kind of degradable photoresist of double-response type and preparation method thereof and application method 北京化工大学 2019-10-18 CN claimed
CN-106054523-A Double response type degradable photoresist as well as preparation method and use method therefor 北京化工大学 2016-10-26 CN claimed
CN-105906049-A Advanced treatment process of refuse leachate and concentrated liquor 中原工学院 2016-08-31 CN claimed
US-6989052-B1 Phase change ink printing process XEROX CORPORATION (US) 2006-01-24 US claimed
US-20060004123-A1 PHASE CHANGE INK PRINTING PROCESS XEROX CORPORATION 2006-01-05 US claimed
CN-1094919-C Method for preparing neo-pentadiol SHANDONG XINHUA PHARMACEUTICAL (CN) 2002-11-27 CN claimed
CN-1301685-A Method for preparing neo-pentadiol XINHUA PHARMACEUTICAL CO LTD S (CN) 2001-07-04 CN claimed
US-4739091-A FIREPROOFING AGENTS FOR POLYURETHANES-MADE FROM PHOSPHORUS TRIHALIDE, NEOCARBYL ALCOHOL, OXIRANE AND HALOGENATION AGENT THE DOW CHEMICAL COMPANY (US) 1988-04-19 US claimed
US-4255340-A Method for preparing an alkenyl-substituted dicarboxylic acid anhydride TEXACO INC. (US) 1981-03-10 US claimed
JP-8217775-A None JP disclosed
CN-122060402-A Radiation-cured wear-resistant paint and preparation method thereof 江苏佳饰家新材料集团股份有限公司 2026-05-19 CN disclosed
WO-2025262243-A1 THIENO- AND THIAZOLOPYRIMIDINE-2,6-DIONES AND USE THEREOF AS IMMUNOMODULATORS INVIOS GMBH (AT) 2025-12-26 WO disclosed
US-20250388605-A1 HETEROBIFUNCTIONAL COMPOUNDS AND METHODS OF TREATING DISEASE HALDA THERAPEUTICS OPCO INC (US) 2025-12-25 US disclosed
US-4690954-A SCORCH RESISTANT, ODORLESS, PROCESSABLE THE DOW CHEMICAL COMPANY (US) 1987-09-01 US disclosed
US-4255340-A Method for preparing an alkenyl-substituted dicarboxylic acid anhydride TEXACO INC. (US) 1981-03-10 US disclosed
US-4251380-A DISPERSANT TEXACO INC. (US) 1981-02-17 US disclosed
US-4125555-A CHAR FORMATION PROMOTERS IN POLYMERS THE DOW CHEMICAL COMPANY (US) 1978-11-14 US disclosed