Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TGFBR1 | P36897 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL8087515 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL64985 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL27649 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL11006034 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL1974753 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL443711 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL9194150 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL1485968 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL4878336 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 | |
| Methacrylic Acid SCHEMBL23639 | 1.00 | TGFBR1 (0.32) | TGFBR1TDP1TET2ALDH1A1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 7226 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12015123-B2 | Lithium ion secondary battery | AESC JAPAN LTD. (JP) | 2024-06-18 | — | — | US | claimed |
| US-20240158558-A1 | CURABLE RESIN COMPOSITION FOR DECORATION FILM, DECORATION FILM AND MOLDED DECORATION FILM ARTICLE | BENQ MATERIALS CORPORATION (TW) | 2024-05-16 | — | — | US | claimed |
| US-20240150592-A1 | PHOTOCURABLE CONDUCTIVE BLACK COMPOSITION AND A METHOD FOR FORMING A CURED PRODUCT THEREOF | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-05-09 | — | — | US | claimed |
| US-20240108555-A1 | UNREACTIVE TRANSFER SPLINTS | VOCO GMBH (DE) | 2024-04-04 | — | — | US | claimed |
| EP-4338702-A1 | NON-REACTIVE TRANSFER RAILS | VOCO GmbH (DE) | 2024-03-20 | — | — | EP | claimed |
| US-11926688-B2 | Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes | BRIDGESTONE AMERICAS TIRE OPERATIONS, LLC (US) | 2024-03-12 | — | — | US | claimed |
| US-11899364-B2 | Photosensitive polyimide compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-02-13 | — | — | US | claimed |
| WO-2024018040-A1 | CURABLE COMPOSITIONS | ARKEMA FRANCE (FR) | 2024-01-25 | — | — | WO | claimed |
| EP-4308657-A1 | HARD COATING COMPOSITION, HARD COATING FILM OBTAINED THEREFROM, LAMINATE INCLUDING HARD COATING FILM, METHOD OF FORMING HARD COATING FILM, AND ARTICLE INCLUDING HARD COATING FILM | Samsung Electronics Co., Ltd. (KR) | 2024-01-24 | — | — | EP | claimed |
| US-20240018399-A1 | RADIATION CURABLE (METH) ACRYLIC ADHESIVE COMPOSITION | HENKEL AG & CO. KGAA (DE) | 2024-01-18 | — | — | US | claimed |
| WO-2001085812-A1 | COMPOSITIONS AND METHODS FOR THE MANUFACTURE OF OPHTHALMIC LENSES | JOHNSON & JOHNSON VISION CARE, INC. (US) | 2001-11-15 | — | — | WO | claimed |
| WO-2001048095-A1 | PHOTO-CURABLE COMPOSITION AND THE CURED PRODUCTS | DSM N.V. (NL) | 2001-07-05 | — | — | WO | claimed |
| EP-0997484-A1 | Cold curable resin composition and base material coated with the same | TOYO INK MANUFACTURING CO., LTD. (JP) | 2000-05-03 | — | — | EP | claimed |
| EP-0813740-B1 | REDUCED SOLVENT ANTISTATIC HARD COAT | IMATION CORP A DELAWARE CORP (US) | 1998-08-26 | — | — | EP | claimed |
| EP-0808498-B1 | OVERCOAT FOR OPTICAL RECORDING MEDIUM | IMATION CORP A DELAWARE CORP (US) | 1998-08-12 | — | — | EP | claimed |
| EP-0813740-A1 | REDUCED SOLVENT ANTISTATIC HARD COAT | Imation Corp (a Delaware Corporation) (US) | 1997-12-29 | — | — | EP | claimed |
| EP-0808498-A1 | OVERCOAT FOR OPTICAL RECORDING MEDIUM | Imation Corp (a Delaware Corporation) (US) | 1997-11-26 | — | — | EP | claimed |
| US-5609990-A | CURED COMPOSITION OF RADIATION-CURABLE COMPONENT, NONIONIC PERFLUORO SURFACTANT, RADIATION-CURABLE SILICONE-CONTAINING COMPOUND | IMATION CORP. (US) | 1997-03-11 | — | — | US | claimed |
| WO-1996024929-A1 | REDUCED SOLVENT ANTISTATIC HARD COAT | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-08-15 | — | — | WO | claimed |
| WO-1996024928-A1 | OVERCOAT FOR OPTICAL RECORDING MEDIUM | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-08-15 | — | — | WO | claimed |