Iodide

Iodide

SCHEMBL3705299

CCCP.I

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL219158 0.94
SCHEMBL28247476 0.89
Bromide SCHEMBL29136400 0.89 TSHR (0.33)
Ammonia Solution, Strong SCHEMBL27384509 0.89
Bromide SCHEMBL808650 0.89
Hydrochloric Acid SCHEMBL9619389 0.89 TSHR (0.33)
Fluoride SCHEMBL31683109 0.89
Hydrochloric Acid SCHEMBL9619393 0.89
Water SCHEMBL2332999 0.89
Bromide SCHEMBL29136399 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250320381-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2025-10-16 US disclosed
US-20250282977-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2025-09-11 US disclosed
CN-105378871-A Method of enhancing Electrochemical Double Layer Capacitor (EDLC) performance and EDLC device formed thereby ESIONIC ES INC 2016-03-02 CN disclosed
WO-2010094164-A1 PROCESS FOR THE HYDROGENATION OF IMINES CHEMINOVA A/S (DK) 2010-08-26 WO disclosed