Water

Water

SCHEMBL2332999

CCCP.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL219158 0.94
SCHEMBL27075365 0.89
Phosphine SCHEMBL27358342 0.89
SCHEMBL28247476 0.89
Fluoride SCHEMBL31683109 0.89
Hydrochloric Acid SCHEMBL9619389 0.89 TSHR (0.33)
Bromide SCHEMBL808650 0.89
Iodide SCHEMBL3705299 0.89
Hydrochloric Acid SCHEMBL9619393 0.89
Ammonia Solution, Strong SCHEMBL27384509 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110506100-A Composite and application method after chemical mechanical grinding ENTEGRIS INC 2019-11-26 CN claimed
CN-110506100-A Composite and application method after chemical mechanical grinding ENTEGRIS INC 2019-11-26 CN disclosed
CN-110234719-A Compositions and methods for removing cerium oxide particles from surfaces 恩特格里斯公司 2019-09-13 CN disclosed
CN-108089399-A Photosensitive resin composition, compound, laminated structure and include its display device and electronic device 三星电子株式会社 2018-05-29 CN disclosed
CN-105524549-A ACTIVATION ENERGY RADIATION-CURABLE SILICONE COATING COMPOSITION AND COATED ARTICLE SHINETSU CHEMICAL CO 2016-04-27 CN disclosed
CN-105308135-A Silicone coating composition and coated article SHINETSU CHEMICAL CO 2016-02-03 CN disclosed
CN-104559364-A PHOTOCURABLE COATING COMPOSITION, LAMINATE, AND AUTOMOTIVE HEADLAMP COVERING SHEET SHINETSU CHEMICAL CO 2015-04-29 CN disclosed
CN-102239201-B Method for producing organosilicon compounds having amino groups WACKER CHEMIE AG 2013-11-06 CN disclosed
CN-101314698-B Abrasion-resistant coating composition and coated article SHIN ETSU EHEMICAL CO LTD 2013-01-02 CN disclosed
CN-101616956-B Polymer-(organo)clay complex, composition comprising the complex, sheet-like material comprising the complex or composition, and method for production of polymer-(organo)clay complex ASAHI CHEMICAL CORP (JP) 2012-08-22 CN disclosed
CN-102239201-A Method for producing organosilicon compounds having amino groups WACKER CHEMIE AG 2011-11-09 CN disclosed
EP-2358792-A1 METHOD FOR PRODUCING ORGANOSILICON COMPOUNDS HAVING AMINO GROUPS Wacker Chemie AG (DE) 2011-08-24 EP disclosed
WO-2010069820-A1 METHOD FOR PRODUCING ORGANOSILICON COMPOUNDS HAVING AMINO GROUPS WACKER CHEMIE AG (DE) 2010-06-24 WO disclosed
CN-101616956-A Polymkeric substance-(organic) clay complex, use the composition of this mixture and use the manufacture method of their flap and polymkeric substance-(organic) clay complex ASAHI CHEMICAL CORP (JP) 2009-12-30 CN disclosed
CN-101407582-A Linear poly(dialkyl) organosiloxane having poly(oxyalkylene), amino functional group and end alkoxy GOLDSCHMIDT CO LTD (DE) 2009-04-15 CN disclosed
CN-101314698-A Abrasion-resistant coating composition and coated article SHINETSU CHEMICAL CO (JP) 2008-12-03 CN disclosed