SCHEMBL370649

SCHEMBL370649

CCCCCN=Nc1cc(S(=O)(=O)O)c2cccnc2c1O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.60
HIF1A Q16665 2/20 0.60
HPGD P15428 1/20 0.60
PTPN11 Q06124 3/20 0.56
PTPN7 P35236 2/20 0.56
ALOX15 P16050 2/20 0.56
HSD17B10 Q99714 2/20 0.56
PTPRC P08575 1/20 0.56
PTPN1 P18031 1/20 0.56
PTPN6 P29350 1/20 0.56
PTPRJ Q12913 1/20 0.56
DUSP26 Q9BV47 1/20 0.56
COMT P21964 9/20 0.44
ENPP2 Q13822 1/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
NSD2 O96028 1/20 0.42
POLB P06746 1/20 0.42
IDE P14735 1/20 0.42
DUSP3 P51452 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL370648 1.00 CYP1A2 (0.60) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL7630786 0.76 CYP1A2 (0.66) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL7630773 0.76 CYP1A2 (0.66) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL8072742 0.76 CYP1A2 (0.77) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL13921616 0.76 CYP1A2 (0.80) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL13936089 0.76 CYP1A2 (0.73) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL13921609 0.76 CYP1A2 (0.84) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL17552280 0.76 CYP1A2 (0.80) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL17550006 0.76 CYP1A2 (0.76) CYP1A2HIF1AHPGDPTPN11PTPN7
SCHEMBL4461500 0.75 COMT (0.64) CYP1A2HIF1AHPGDPTPN11PTPN7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150307818-A1 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECH MATERIALS (US) 2015-10-29 US claimed
US-7690783-B2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJIFILM CORPORATION (JP) 2010-04-06 US claimed
US-20150307818-A1 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECH MATERIALS (US) 2015-10-29 US disclosed
US-9063431-B2 Aqueous cleaner for the removal of post-etch residues ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2015-06-23 US disclosed
US-20130296214-A1 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-11-07 US disclosed
EP-2593964-A2 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES Advanced Technology Materials, Inc. (US) 2013-05-22 EP disclosed
WO-2012009639-A9 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-05-24 WO disclosed
WO-2012009639-A2 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-01-19 WO disclosed
US-20100261632-A1 NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-10-14 US disclosed
WO-2010091045-A2 NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF POLYMERS AND OTHER ORGANIC MATERIAL FROM A SURFACE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-08-12 WO disclosed
US-7690783-B2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJIFILM CORPORATION (JP) 2010-04-06 US disclosed
WO-2009032460-A1 NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2009-03-12 WO disclosed
EP-1927889-A1 Lithographic printing plate precursor FUJIFILM Corporation (JP) 2008-06-04 EP disclosed
EP-1693427-A2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJI PHOTO FILM CO., LTD. (JP) 2006-08-23 EP disclosed
US-20060181591-A1 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJI PHOTO FILM CO., LTD. 2006-08-17 US disclosed
US-6558873-B1 Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum FUJI PHOTO FILM CO., LTD. (JP) 2003-05-06 US disclosed
EP-1091251-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-04-11 EP disclosed