⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28340253 | 0.78 | — | — | |
| SCHEMBL6630349 | 0.78 | — | — | |
| SCHEMBL27529688 | 0.77 | SLC6A1 (0.31) | — | |
| SCHEMBL337230 | 0.75 | — | — | |
| SCHEMBL1847750 | 0.75 | — | — | |
| Hydrochloric Acid SCHEMBL720508 | 0.74 | SLC6A1 (0.38) | — | |
| SCHEMBL3364075 | 0.74 | — | — | |
| SCHEMBL27260254 | 0.74 | — | — | |
| SCHEMBL2921164 | 0.74 | — | — | |
| SCHEMBL28340254 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12365815-B2 | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | RESONAC CORPORATION (JP) | 2025-07-22 | — | — | US | disclosed |
| CN-120202233-A | Active energy ray-curable composition and cured product | 三洋化成工业株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-111433311-B | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | 株式会社力森诺科 | 2025-05-30 | — | — | CN | disclosed |
| WO-2024214603-A1 | ACTIVE ENERGY RAY-CURABLE COMPOSITION AND CURED PRODUCT THEREOF | 三洋化成工業株式会社 | 2024-10-17 | — | — | WO | disclosed |
| WO-2024095637-A1 | ACTINIC-RAY-CURABLE COMPOSITION AND CURED OBJECT | 三洋化成工業株式会社 | 2024-05-10 | — | — | WO | disclosed |
| CN-110998800-B | Polishing liquid, polishing liquid set and polishing method | 株式会社力森诺科 | 2023-09-22 | — | — | CN | disclosed |
| US-20230295466-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, AND DEFECT SUPPRESSION METHOD | RESONAC CORPORATION (JP) | 2023-09-21 | — | — | US | disclosed |
| US-11649377-B2 | Polishing liquid, polishing liquid set and polishing method | RESONAC CORPORATION (JP) | 2023-05-16 | — | — | US | disclosed |
| US-11634670-B2 | Cleaning agent for semiconductor component, and use thereof | TOAGOSEI CO. LTD. (JP) | 2023-04-25 | — | — | US | disclosed |
| US-20200299544-A1 | POLISHING LIQUID, POLISHING LIQUID SET AND POLISHING METHOD | RESONAC CORPORATION (JP) | 2020-09-24 | — | — | US | disclosed |
| EP-1866166-A1 | INK SET FOR INK JET RECORDING, INK FOR INK JET RECORDING, AND INK JET IMAGE RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2007-12-19 | — | — | EP | disclosed |
| US-20070175104-A1 | Polishing slurry for silicon oxide, additive liquid and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070046715-A1 | Image forming apparatus | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20070046719-A1 | Image forming apparatus | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20070024686-A1 | Image forming apparatus | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-20070024684-A1 | Image forming apparatus and image forming method | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-20060289826-A1 | Hazardous substance decomposer and process for producing the same | RESONAC CORPORATION (JP) | 2006-12-28 | — | — | US | disclosed |
| WO-2006104281-A1 | INK SET FOR INK JET RECORDING, INK FOR INK JET RECORDING, AND INK JET IMAGE RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2006-10-05 | — | — | WO | disclosed |
| US-20060148667-A1 | Cmp polishing compound and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| CN-1745460-A | CMP polishing slurry and polishing method | HITACHI CHEMICAL CO LTD (JP) | 2006-03-08 | — | — | CN | disclosed |