SCHEMBL372853

SCHEMBL372853

CCCCc1n(C)cc[n+]1C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC8 Q9BY41 4/20 0.47
APOBEC3A P31941 4/20 0.41
APOBEC3G Q9HC16 4/20 0.41
SMN1; SMN2 Q16637 4/20 0.41
KDM4E B2RXH2 2/20 0.41
POLB P06746 3/20 0.40
CTDSP1 Q9GZU7 1/20 0.40
HTT P42858 8/20 0.38
NPC1 O15118 8/20 0.38
RAB9A P51151 8/20 0.38
NPSR1 Q6W5P4 5/20 0.38
MAPK1 P28482 4/20 0.38
HSP90AA1 P07900 2/20 0.38
MAPT P10636 2/20 0.38
MEN1 O00255 1/20 0.38
APAF1 O14727 1/20 0.38
PLA2G1B P04054 1/20 0.38
KMT2A Q03164 1/20 0.38
ATG4B Q9Y4P1 1/20 0.38
LMNA P02545 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL1894046 0.98 HDAC8 (0.45) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
Hydrochloric Acid SCHEMBL30980120 0.98 HDAC8 (0.45) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL1835131 0.94 HDAC8 (0.42) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL29048074 0.92 NPC1 (0.43) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL1831748 0.92 NPC1 (0.43) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL30645316 0.92 NPC1 (0.43) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL6296126 0.92 NPC1 (0.43) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL1835103 0.92 NPC1 (0.43) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL20787057 0.92 NPC1 (0.43) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E
SCHEMBL1832602 0.92 NPC1 (0.43) HDAC8APOBEC3AAPOBEC3GSMN1; SMN2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11996557-B2 Direct regeneration of lithium ion cathodes by ionothermal relithiation UT-BATTELLE, LLC (US) 2024-05-28 US disclosed
US-11795583-B2 Plasticized melt spinning process using ionic liquids for production of polyacrylonitrile fibers UT-BATTELLE, LLC (US) 2023-10-24 US disclosed
US-20220376240-A1 DIRECT REGENERATION OF LITHIUM ION CATHODES BY IONOTHERMAL RELITHIATION U. S. DEPARTMENT OF ENERGY 2022-11-24 US disclosed
US-20220235493-A1 PLASTICIZED MELT SPINNING PROCESS USING IONIC LIQUIDS FOR PRODUCTION OF POLYACRYLONITRILE FIBERS UNIVERSITY OF TENNESSEE RESEARCH FOUNDATION 2022-07-28 US disclosed
CN-114716944-A Surface protective film 日东电工株式会社 2022-07-08 CN disclosed
CN-110476003-B Heat insulation base plate 日东电工株式会社 2022-04-22 CN disclosed
CN-113249053-B Surface protective film 日东电工株式会社 2022-04-15 CN disclosed
US-11251433-B2 Nitrogen-sulfur-carbon nanocomposites and their application as cathode materials in lithium-sulfur batteries UT-BATTELLE, LLC (US) 2022-02-15 US disclosed
US-11186893-B2 Rare earth amide compositions UT-BATTELLE, LLC (US) 2021-11-30 US disclosed
CN-113249053-A Surface protective film 日东电工株式会社 2021-08-13 CN disclosed
EP-2587580-A1 ELECTROLYTE MATERIAL, ELECTROLYTE FOR LITHIUM SECONDARY BATTERY, LITHIUM SECONDARY BATTERY USING SAME, AND NOVEL LITHIUM SALT The Nippon Synthetic Chemical Industry Co., Ltd. (JP) 2013-05-01 EP disclosed
US-20130089777-A1 MATERIAL FOR USE AS ELECTROLYTE, LITHIUM SECONDARY BATTERY ELECTROLYTE, LITHIUM SECONDARY BATTERY EMPLOYING THE SAME, AND NOVEL LITHIUM SALT THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD. (JP) 2013-04-11 US disclosed
EP-1698606-B1 FLUORINATING AGENT AND METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND USING SAME SUMITOMO CHEMICAL CO (JP) 2013-02-20 EP disclosed
EP-2410601-A1 IONIC LIQUID, ELECTROLYTE, LITHIUM SECONDARY BATTERY COMPRISING SAME, AND PROCESS FOR PRODUCING IONIC LIQUID The Nippon Synthetic Chemical Industry Co., Ltd. (JP) 2012-01-25 EP disclosed
US-20110311865-A1 IONIC LIQUID, ELECTROLYTE, LITHIUM SECONDARY BATTERY USING THE SAME, AND PROCESS FOR PRODUCING IONIC LIQUID THE NIPPON SYNTHETIC CHEMICAL INDUSTRY CO., LTD. (JP) 2011-12-22 US disclosed
US-7939697-B2 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-05-10 US disclosed
US-20090287025-A1 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED 2009-11-19 US disclosed
US-7569703-B2 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-04 US disclosed
US-20070135634-A1 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-06-14 US disclosed
EP-1698606-A1 FLUORINATING AGENT AND METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND USING SAME Sumitomo Chemical Company, Limited (JP) 2006-09-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070135634-A1 Fluorinating agent and method for producing fluorine-containing compound using the same AFF1, AFF2, AFF4 HDAC8 3030/4885APOBEC3A 3356/4885APOBEC3G 2986/4885
US-20090287025-A1 Fluorinating agent and method for producing fluorine-containing compound using the same AFF1, AFF2, AFF4 HDAC8 3030/4885APOBEC3A 3356/4885APOBEC3G 2986/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.