Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.78 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.78 |
| ▸ | GAA | P10253 | 1/20 | 0.78 |
| ▸ | HPGD | P15428 | 1/20 | 0.78 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.60 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.60 |
| ▸ | TSHR | P16473 | 1/20 | 0.60 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.60 |
| ▸ | TLR8 | Q9NR97 | 11/20 | 0.58 |
| ▸ | PARP1 | P09874 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.50 |
| ▸ | BCHE | P06276 | 1/20 | 0.49 |
| ▸ | ACHE | P22303 | 1/20 | 0.49 |
| ▸ | TLR7 | Q9NYK1 | 2/20 | 0.48 |
| ▸ | PDE4A | P27815 | 1/20 | 0.48 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.48 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5318703 | 0.94 | KDM4E (0.75) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL9433976 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL21633651 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL5325559 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL5319761 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL5318249 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL5318248 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL9434493 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL2537670 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 | |
| SCHEMBL5321847 | 0.92 | KDM4E (0.72) | KDM4EALDH1A1GAAHPGDCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106233205-B | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | 日立化成株式会社 | 2020-06-23 | — | — | CN | claimed |
| CN-101290471-B | Photoresist combination and laminating body | ASAHI KASEI EMD CORP | 2011-07-06 | — | — | CN | claimed |
| CN-101290471-A | Photoresist combination and laminating body | ASAHI KASEI EMD CORP (JP) | 2008-10-22 | — | — | CN | claimed |
| US-6156870-A | Resin composition which can be cured by application of heat or irradiation of light, film, laminate and production of multilayer wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-12-05 | — | — | US | claimed |
| EP-4388020-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | Resonac Corporation (JP) | 2024-06-26 | — | — | EP | disclosed |
| CN-118131567-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2024-06-04 | — | — | CN | disclosed |
| CN-118043365-A | Polymer, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2024-05-14 | — | — | CN | disclosed |
| CN-113412289-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2024-04-05 | — | — | CN | disclosed |
| CN-117099044-A | Photosensitive resin film, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2023-11-21 | — | — | CN | disclosed |
| CN-117083568-A | Photosensitive element and method for manufacturing photosensitive element | 株式会社力森诺科 | 2023-11-17 | — | — | CN | disclosed |
| CN-111315828-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-09-29 | — | — | CN | disclosed |
| CN-112154167-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-08-22 | — | — | CN | disclosed |
| CN-101194191-A | Process for producing color filter, color filter, liquid crystal display element, and liquid crystal display device | FUJI FILM CORP (JP) | 2008-06-04 | — | — | CN | disclosed |
| CN-101101444-A | Light-sensitive resin composition, light-sensitive transfer printing material, separating wall and manufacturing method thereof, color filter and manufacturing method thereof, and displaying device | FUJIFILM CORP (JP) | 2008-01-09 | — | — | CN | disclosed |
| WO-2007089040-A1 | LIQUID CRYSTAL DISPLAY DEVICE AND COLOR FILM PLATE, AND PROCESSES FOR PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | WO | disclosed |
| CN-1721991-A | Production method for photosensitive resin composition and element and related members | HITACHI CHEMICAL CO LTD (JP) | 2006-01-18 | — | — | CN | disclosed |
| CN-1228688-C | Photosensitive resin composition, photosensitive element, method for producing protective layer pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2005-11-23 | — | — | CN | disclosed |
| CN-1432141-A | Photosensitive resin composition, photosensitive element, method for producing protective layer pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 2003-07-23 | — | — | CN | disclosed |
| US-6156870-A | Resin composition which can be cured by application of heat or irradiation of light, film, laminate and production of multilayer wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-12-05 | — | — | US | disclosed |
| US-5334484-A | Using an acridine compound as photoinitiator | HITACHI CHEMICAL CO., LTD. (JP) | 1994-08-02 | — | — | US | disclosed |