⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14198795 | 0.91 | — | — | |
| SCHEMBL14595042 | 0.88 | — | — | |
| SCHEMBL14997895 | 0.88 | TSHR (0.32) | — | |
| SCHEMBL1002365 | 0.87 | — | — | |
| SCHEMBL373532 | 0.87 | — | — | |
| SCHEMBL17019512 | 0.86 | — | — | |
| SCHEMBL14286452 | 0.86 | — | — | |
| SCHEMBL19220476 | 0.84 | — | — | |
| SCHEMBL15745730 | 0.84 | — | — | |
| SCHEMBL1702620 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050069564-A1 | Use of siloxanes as evaporable supports | MOMENTIVE PERFORMANCE MATERIALS INC. | 2005-03-31 | — | — | US | claimed |
| US-20040197284-A1 | Cosmetic composition comprising a volatile fatty phase | L'OREAL S.A. (FR) | 2004-10-07 | — | — | US | claimed |
| US-6268436-B1 | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-31 | — | — | US | claimed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| US-20250349883-A1 | MODIFIED SULFIDE SOLID ELECTROLYTE AND PRODUCTION METHOD THEREFOR, AND ELECTRODE COMPOSITE MATERIAL AND LITHIUM ION BATTERY | IDEMITSU KOSAN CO.,LTD. (JP) | 2025-11-13 | — | — | US | disclosed |
| US-20250253333-A1 | MODIFIED SULFIDE SOLID ELECTROLYTE AND PRODUCTION METHOD FOR SAME, AND ELECTRODE COMBINED MATERIAL AND LITHIUM-ION BATTERY | IDEMITSU KOSAN CO.,LTD. (JP) | 2025-08-07 | — | — | US | disclosed |
| EP-3558222-B1 | WATER-IN-OIL EMULSION COMPRISING A PARTICULAR EMULSIFYING SYSTEM, A LIPOPHILIC CLAY, AND AN ORGANOPOLYSILOXANE ELASTOMER POWDER COATED WITH A SILICONE RESIN | OREAL (FR) | 2024-04-03 | — | — | EP | disclosed |
| EP-3558238-B1 | COMPOSITION CONTAINING AN OILY CONTINUOUS PHASE, A LIQUID DIPHENYLACRYLATE UV-SCREENING AGENT, A LIQUID SALICYLATE UV-SCREENING AGENT AND A NON-CYCLIC VOLATILE SILICONE OIL | OREAL (FR) | 2023-08-23 | — | — | EP | disclosed |
| US-11376205-B2 | Water-in-oil emulsion containing baicalin, a xanthine base, a vitamin B3, and a polyvalent metal cation salt | L'OREAL (FR) | 2022-07-05 | — | — | US | disclosed |
| CN-110099662-B | Water-in-oil emulsion comprising a specific emulsifying system, a lipophilic clay and a silicone resin-coated organopolysiloxane elastomer powder | 莱雅公司 | 2022-04-26 | — | — | CN | disclosed |
| CN-114380947-A | Halogen-free phosphorus-free flame-retardant shape memory bismaleimide resin and preparation method thereof | 苏州大学 | 2022-04-22 | — | — | CN | disclosed |
| US-6303263-B1 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | INTERNATIONAL BUSINESS MACHINES MACHINES | 2001-10-16 | — | — | US | disclosed |
| US-6268436-B1 | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-31 | — | — | US | disclosed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | disclosed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | disclosed |
| EP-0939339-A1 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | International Business Machines Corporation (US) | 1999-09-01 | — | — | EP | disclosed |
| EP-0939064-A2 | Optical fiber and fiber-optic sensing system using the same | Hitachi, Ltd. (JP) | 1999-09-01 | — | — | EP | disclosed |
| EP-0939340-A1 | Radiation sensitive resists | International Business Machines Corporation (US) | 1999-09-01 | — | — | EP | disclosed |
| EP-0022056-B1 | DIMERS OF TRI-IODATED ISOPHTHALIC ACID DIAMIDES, THEIR PREPARATION, X-RAY CONTRAST AGENT CONTAINING THEM, AND DIMER OF TRI-IODATED ISOPHTHALIC ACID CHLORIDE | SCHERING AKTIENGESELLSCHAFT (DE) | 1983-06-29 | — | — | EP | disclosed |