SCHEMBL3735408

SCHEMBL3735408

O=C(C=CC(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.38
HCAR2 Q8TDS4 6/20 0.36
THRB P10828 1/20 0.33
MAPT P10636 1/20 0.30
RAB9A P51151 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10457601 1.00 ATM (0.38) ATMHCAR2THRBMAPTRAB9A
SCHEMBL10457602 1.00 ATM (0.38) ATMHCAR2THRBMAPTRAB9A
SCHEMBL2522481 1.00 ATM (0.38) ATMHCAR2THRBMAPTRAB9A
SCHEMBL11644944 1.00 ATM (0.38) ATMHCAR2THRBMAPTRAB9A
SCHEMBL1426647 1.00 ATM (0.38) ATMHCAR2THRBMAPTRAB9A
SCHEMBL3817894 0.98 ATM (0.39) ATMHCAR2THRBMAPTRAB9A
SCHEMBL1426811 0.98 ATM (0.39) ATMHCAR2THRBMAPTRAB9A
SCHEMBL10456292 0.98 ATM (0.39) ATMHCAR2THRBMAPTRAB9A
SCHEMBL29360899 0.93 HCAR2 (0.47) ATMHCAR2THRB
SCHEMBL13894687 0.93 ATM (0.32) ATMHCAR2THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100213454-A1 PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-08-26 US claimed
WO-2009055628-A1 PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-04-30 WO claimed
US-8309376-B2 Process and materials for making contained layers and devices made with same E I DU PONT DE NEMOURS AND COMPANY (US) 2012-11-13 US disclosed
US-20100213454-A1 PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-08-26 US disclosed
EP-1524552-B1 Silver halide color photographic light-sensitive material FUJIFILM CORP (JP) 2009-08-19 EP disclosed
WO-2009055628-A1 PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-04-30 WO disclosed
US-20080113305-A1 SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL FUJIFILM CORPORATION 2008-05-15 US disclosed
EP-1341035-B1 Silver halide color photographic light-sensitive material FUJIFILM CORP (JP) 2007-12-26 EP disclosed
US-7183044-B2 Silver halide color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2007-02-27 US disclosed
EP-1524552-A2 Silver halide color photographic light-sensitive material Fuji Photo Film Co., Ltd (JP) 2005-04-20 EP disclosed
US-20050069826-A1 Silver halide color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. 2005-03-31 US disclosed
US-6815152-B2 FOR USE AS CINEMATOGRAPHIC COLOR PHOTOGRAPHIC PHOTOSENSITIVE MATERIAL, IMAGE QUALITY, STORAGE STABILITY AND PROCESSING STABILITY FUJI PHOTO FILM. CO., LTD. (JP) 2004-11-09 US disclosed
US-20040058284-A1 Silver halide color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. 2004-03-25 US disclosed
US-20030211430-A1 Silver halide photosensitive material FUJI PHOTO FILM CO., LTD. 2003-11-13 US disclosed
US-20030203326-A1 Silver halide color photographic photosensitive material FUJI PHOTO FILM CO., LTD. 2003-10-30 US disclosed
EP-1341035-A2 Silver halide color photographic light-sensitive material Fuji Photo Film Co., Ltd. (JP) 2003-09-03 EP disclosed
US-4933406-A OXYGEN-PERMEABLE, RIGID NIPPON OIL AND FATS CO., LTD. (JP) 1990-06-12 US disclosed