SCHEMBL3736283

SCHEMBL3736283

[CH2]CCCC(O)[CH]O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3675527 0.94
SCHEMBL3677602 0.92 TRPA1 (0.30)
SCHEMBL10865968 0.92 TRPA1 (0.30)
SCHEMBL3754462 0.92 TRPA1 (0.30)
SCHEMBL3769249 0.92 TRPA1 (0.30)
SCHEMBL624558 0.82
SCHEMBL196198 0.76
SCHEMBL9301441 0.76
SCHEMBL5152189 0.74
SCHEMBL580161 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021105779-A1 NEW SOLID FORMS OF DAPAGLIFLOZIN ALPARIS, S.A. DE C.V. (MX) 2021-06-03 WO disclosed
EP-2838547-B1 COMPOUNDS FOR THE TREATMENT AND/OR CARE OF THE SKIN AND/OR MUCOUS MEMBRANES AND THEIR USE IN COSMETIC OR PHARMACEUTICAL COMPOSITIONS LUBRIZOL ADVANCED MAT INC (US) 2019-09-04 EP disclosed
US-9725483-B2 Compounds for the treatment and/or care of the skin and/or mucous membranes and their use in cosmetic or pharmaceutical compositions LIPOTEC, S.A. (ES) 2017-08-08 US disclosed
US-20150104485-A1 COMPOUNDS FOR THE TREATMENT AND/OR CARE OF THE SKIN AND/OR MUCOUS MEMBRANES AND THEIR USE IN COSMETIC OR PHARMACEUTICAL COMPOSITIONS LUBRIZOL ADVANCED MATERIALS, INC. (US) 2015-04-16 US disclosed
US-20100304017-A1 URETHANE AND OLIGOURETHANE DERIVATIVES AND CORRESPONDING USES AND METHODS FOR PRODUCING WATER MARKS USING THE OFFSET PRINTING TECHNIQUE OLIVA GURGUI, ANTONIO (ES) 2010-12-02 US disclosed
US-7723423-B2 Gas-barrier resin composition CRYOVAC, INC. (US) 2010-05-25 US disclosed
EP-1746131-B1 Gas-barrier resin composition CRYOVAC INC (US) 2009-01-21 EP disclosed
US-20070093599-A1 Gas-barrier resin composition CRYOVAC, INC. (US) 2007-04-26 US disclosed
US-7201794-B2 Ink composition SEIKO EPSON CORPORATION (JP) 2007-04-10 US disclosed
EP-1746131-A2 Gas-barrier resin composition Cryovac, Inc. (US) 2007-01-24 EP disclosed
US-20050139124-A1 Ink composition SEIKO EPSON CORPORATION 2005-06-30 US disclosed