Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.48 |
| ▸ | KCNH2 | Q12809 | 6/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.44 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | CA7 | P43166 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | FAAH | O00519 | 4/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL4620191 | 1.00 | LTA4H (0.48) | LTA4HKCNH2TSHRTP53PLA2G4B | |
| Trifluoromethanesulfonic Acid SCHEMBL7624035 | 1.00 | LTA4H (0.48) | LTA4HKCNH2TSHRTP53PLA2G4B | |
| Trifluoromethanesulfonic Acid SCHEMBL7623512 | 1.00 | LTA4H (0.48) | LTA4HKCNH2TSHRTP53PLA2G4B | |
| Trifluoromethanesulfonic Acid SCHEMBL4620123 | 1.00 | LTA4H (0.48) | LTA4HKCNH2TSHRTP53PLA2G4B | |
| Trifluoromethanesulfonic Acid SCHEMBL3144088 | 0.96 | TSHR (0.47) | LTA4HKCNH2TSHRTP53CA12 | |
| Trifluoromethanesulfonic Acid SCHEMBL4619974 | 0.95 | TSHR (0.48) | LTA4HKCNH2TSHRTP53PLA2G4B | |
| Trifluoromethanesulfonic Acid SCHEMBL4620792 | 0.95 | TSHR (0.48) | LTA4HKCNH2TSHRTP53PLA2G4B | |
| SCHEMBL29745929 | 0.94 | LTA4H (0.47) | LTA4HTSHRTP53PLA2G4BCA12 | |
| SCHEMBL2440290 | 0.94 | LTA4H (0.47) | LTA4HTSHRTP53PLA2G4BCA12 | |
| SCHEMBL2436488 | 0.92 | LTA4H (0.45) | LTA4HTSHRTP53PLA2G4BCA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | disclosed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |