SCHEMBL3745633

SCHEMBL3745633

CCCCCCCCN(CCCCCCCC)c1ccc(/C=C/C2=CC(=C(C#N)C#N)C=C(C)O2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
INSR P06213 2/20 0.36
CHRM2 P08172 1/20 0.35
CHRM4 P08173 1/20 0.35
CHRM5 P08912 1/20 0.35
CHRM1 P11229 1/20 0.35
CHRM3 P20309 1/20 0.35
SLC16A3 O15427 2/20 0.34
SLC16A1 P53985 2/20 0.34
MEN1 O00255 3/20 0.34
MAPT P10636 3/20 0.34
KMT2A Q03164 3/20 0.34
POLB P06746 2/20 0.34
NPC1 O15118 1/20 0.34
THRB P10828 1/20 0.34
RECQL P46063 1/20 0.34
RAB9A P51151 1/20 0.34
BLM P54132 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3745634 1.00 ALDH1A1 (0.37) ALDH1A1KDM4ESMN1; SMN2INSRCHRM2
SCHEMBL17584800 0.99 ALDH1A1 (0.38) ALDH1A1KDM4ESMN1; SMN2INSRCHRM2
SCHEMBL17584799 0.99 ALDH1A1 (0.38) ALDH1A1KDM4ESMN1; SMN2INSRCHRM2
SCHEMBL6322984 0.96 CHRM2 (0.39) ALDH1A1KDM4ESMN1; SMN2INSRCHRM2
SCHEMBL7997817 0.89 CHRM2 (0.41) ALDH1A1KDM4ESMN1; SMN2INSRCHRM2
SCHEMBL7997818 0.89 CHRM2 (0.41) ALDH1A1KDM4ESMN1; SMN2INSRCHRM2
SCHEMBL5369512 0.87 MEN1 (0.34) ALDH1A1KDM4ESMN1; SMN2MEN1MAPT
SCHEMBL5369515 0.87 MEN1 (0.34) ALDH1A1KDM4ESMN1; SMN2MEN1MAPT
SCHEMBL10022259 0.87 MEN1 (0.44) ALDH1A1KDM4ESMN1; SMN2CHRM2CHRM4
SCHEMBL11045959 0.87 MEN1 (0.44) ALDH1A1KDM4ESMN1; SMN2CHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9935294-B2 Display device having reflection transmission layer and reflective layer BOE TECHNOLOGY GROUP CO., LTD. (CN) 2018-04-03 US claimed
US-20170207420-A1 DISPLAY SUBSTRATE AND FABRICATING METHOD THEREOF, AND DISPLAY DEVICE HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2017-07-20 US claimed
US-9935294-B2 Display device having reflection transmission layer and reflective layer BOE TECHNOLOGY GROUP CO., LTD. (CN) 2018-04-03 US disclosed
US-20170207420-A1 DISPLAY SUBSTRATE AND FABRICATING METHOD THEREOF, AND DISPLAY DEVICE HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) 2017-07-20 US disclosed
CN-105489551-A Display substrate and manufacturing method thereof and display device BOE TECHNOLOGY GROUP CO LTD 2016-04-13 CN disclosed
US-7838949-B2 Porous gas sensors and method of preparation thereof GEORGIA TECH RESEARCH CORPORATION (US) 2010-11-23 US disclosed
US-7141859-B2 Porous gas sensors and method of preparation thereof GEORGIA TECH RESEARCH CORPORATION (US) 2006-11-28 US disclosed
US-20050193800-A1 Porous gas sensors and method of preparation thereof GEORGIA TECH RESEARCH CORPORATION 2005-09-08 US disclosed
US-20050151214-A1 Porous gas sensors and method of preparation thereof GEORGIA TECH RESEARCH CORPORATION 2005-07-14 US disclosed
US-6893892-B2 Porous gas sensors and method of preparation thereof GEORGIA TECH RESEARCH CORP. (US) 2005-05-17 US disclosed
US-6828253-B2 Enhancement, stabilization and metallization of porous silicon GEORGIA TECH RESEARCH CORPORATION 2004-12-07 US disclosed
US-20040023428-A1 Porous gas sensors and method of preparation thereof GEORGIA TECH RESEARCH CORPORATION 2004-02-05 US disclosed
US-6673644-B2 Porous gas sensors and method of preparation thereof GEORGIA TECH RESEARCH CORPORATION 2004-01-06 US disclosed
US-20030207147-A1 Enhancement, stabilization and metallization of porous silicon GEORGIA TECH RESEARCH CORPORATION 2003-11-06 US disclosed
US-6589883-B2 Enhancement, stabilization and metallization of porous silicon GEORGIA TECH RESEARCH CORPORATION 2003-07-08 US disclosed
US-20010046785-A1 Enhancement, stabilization and metallization of porous silicon GEORGIA TECH RESEARCH CORPORATION 2001-11-29 US disclosed