SCHEMBL3746771

SCHEMBL3746771

O=C(O)Cc1ccc2c(CC(=O)O)cc(CC(=O)O)cc2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1B1 P15121 2/20 0.53
KDM4E B2RXH2 5/20 0.49
HPGD P15428 5/20 0.49
HSD17B10 Q99714 5/20 0.49
ALDH1A1 P00352 4/20 0.49
MAPT P10636 3/20 0.49
PTGS1 P23219 2/20 0.49
AKR1C3 P42330 1/20 0.49
AKR1C2 P52895 1/20 0.49
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
GAA P10253 3/20 0.48
TSHR P16473 3/20 0.48
TDP1 Q9NUW8 2/20 0.48
LMNA P02545 2/20 0.48
RGS12 O14924 1/20 0.48
POLB P06746 1/20 0.48
NFKB1 P19838 1/20 0.48
APEX1 P27695 1/20 0.48
THPO P40225 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30682546 0.84 TDP1 (0.62) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL30496795 0.82 TDP1 (0.66) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL1173033 0.78 GAA (0.57) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL756841 0.78 PTGS1 (0.71) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL21585557 0.76 AKR1B1 (0.63) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL21617912 0.76 PTGS1 (0.63) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL10825727 0.75 GAA (0.70) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL21585553 0.74 TDP1 (0.59) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL11739004 0.74 SLC22A12 (0.51) AKR1B1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL23070737 0.74 AKR1B1 (0.60) AKR1B1KDM4EHPGDHSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6323275-B2 HAVING A LOWERED ADHESION TO THE SKIN TOAGOSEI CO., LTD. (JP) 2001-11-27 US claimed
US-10023752-B2 Conductive material and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-17 US disclosed
US-20170174922-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-22 US disclosed
US-20170130070-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed
US-20170130071-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed
US-9360753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-07 US disclosed
US-9164383-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US disclosed
US-20130029270-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 US disclosed
US-7833333-B2 Low migration, low odor offset inks or varnishes SUN CHEMICAL CORPORATION (US) 2010-11-16 US disclosed
US-20080022891-A1 Low Migration, Low Odor Offset Inks or Varnishes SUN CHEMICAL CORPORATION 2008-01-31 US disclosed
EP-1732995-A1 LOW MIGRATION, LOW ODOUR OFFSET INKS OR VARNISHES Sun Chemical Corporation (US) 2006-12-20 EP disclosed
WO-2005090498-A1 LOW MIGRATION, LOW ODOUR OFFSET INKS OR VARNISHES SUN CHEMICAL CORPORATION (US) 2005-09-29 WO disclosed
US-6323275-B2 HAVING A LOWERED ADHESION TO THE SKIN TOAGOSEI CO., LTD. (JP) 2001-11-27 US disclosed
US-20010004655-A1 CYANOACRYLATE ADHESIVE COMPOSITION TOAGOSEI CO., LTD. (JP) 2001-06-21 US disclosed