⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL876175 | 0.84 | EPHX1 (0.34) | — | |
| SCHEMBL3236347 | 0.80 | — | — | |
| SCHEMBL2556533 | 0.79 | — | — | |
| SCHEMBL15239291 | 0.77 | EPHX1 (0.39) | — | |
| SCHEMBL91653 | 0.77 | — | — | |
| SCHEMBL3230344 | 0.76 | PARP1 (0.30) | — | |
| SCHEMBL761610 | 0.76 | EPHX1 (0.38) | — | |
| SCHEMBL521318 | 0.75 | PDE9A (0.31) | — | |
| SCHEMBL724750 | 0.75 | — | — | |
| SCHEMBL4091211 | 0.75 | EPHX1 (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119937243-A | Chemically amplified positive photosensitive resin composition, cured film, and element having cured film | 奇美实业股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-113126435-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2021-07-16 | — | — | CN | disclosed |
| CN-112394618-A | Chemically amplified positive photosensitive resin composition, and protective film and member produced therefrom | 奇美实业股份有限公司 | 2021-02-23 | — | — | CN | disclosed |
| CN-111381438-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2020-07-07 | — | — | CN | disclosed |
| CN-111324013-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2020-06-23 | — | — | CN | disclosed |
| US-10431825-B2 | Negative electrode for secondary battery, method for manufacturing same, and secondary battery using same | NEC CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| EP-1712551-B1 | 3-Methyl oxetanemethanol derivatives and their use in perfume compositions | INT FLAVORS & FRAGRANCES INC (US) | 2012-11-21 | — | — | EP | disclosed |
| US-7838626-B2 | Polycarbosilane and method for producing same | TOAGOSEI CO., LTD. (JP) | 2010-11-23 | — | — | US | disclosed |
| US-20090163690-A1 | POLYCARBOSILANE AND METHOD FOR PRODUCING SAME | TOAGOSEI CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| US-7354985-B2 | Fluorinated thermoset polyurethane elastomers prepared from polyether prepolymers formed from mono-substituted fluorinated oxetane monomers | AEROJET ROCKETDYNE, INC. (F/K/A AEROJET-GENERAL CORPORATION) | 2008-04-08 | — | — | US | disclosed |
| US-7354985-B2 | Fluorinated thermoset polyurethane elastomers prepared from polyether prepolymers formed from mono-substituted fluorinated oxetane monomers | AEROJET ROCKETDYNE, INC. (F/K/A AEROJET-GENERAL CORPORATION) | 2008-04-08 | — | — | US | disclosed |
| EP-1867674-A1 | POLYCARBOSILANE AND METHOD FOR PRODUCING SAME | TOAGOSEI CO., LTD. (JP) | 2007-12-19 | — | — | EP | disclosed |
| US-20070265180-A1 | 3-Methyl Oxetanemethanol Derivatives and Their Use in Perfume Compositions | INTERNATION FLAVORS & FRAGRANCES INC. | 2007-11-15 | — | — | US | disclosed |
| US-7265231-B2 | 3-methyl oxetanemethanol derivatives and their use in perfume compositions | INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) | 2007-09-04 | — | — | US | disclosed |
| US-20060234882-A1 | 3-Methyl oxetanemethanol derivatives and their use in perfume compositions | INTERNATIONAL FLAVORS & FRAGRANCES INC. | 2006-10-19 | — | — | US | disclosed |
| EP-1712551-A1 | 3-Methyl oxetanemethanol derivatives and their use in perfume compositions | INTERNATIONAL FLAVORS & FRAGRANCES, INC. (US) | 2006-10-18 | — | — | EP | disclosed |