SCHEMBL91653

SCHEMBL91653

COCC1(C)COC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10719390 0.90 EPHX1 (0.39)
SCHEMBL10071381 0.80 EPHX1 (0.41)
SCHEMBL21716748 0.80
SCHEMBL1978276 0.80 EPHX1 (0.50)
SCHEMBL14087631 0.79 KCNA4 (0.31)
SCHEMBL2623186 0.79 EPHX1 (0.39)
SCHEMBL12396788 0.79 EPHX1 (0.34)
SCHEMBL3748115 0.77
SCHEMBL9077720 0.77
SCHEMBL2623189 0.77 EPHX1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119735808-A Bismaleimide resin composition, prepreg prepared from bismaleimide resin composition and laminated board prepared from bismaleimide resin composition 睿龙材料科技(江苏)有限公司 2025-04-01 CN claimed
EP-2609097-A1 PYRIDYL-AMINE FUSED AZADECALIN MODULATORS Corcept Therapeutics, Inc. (US) 2013-07-03 EP claimed
WO-2012027702-A1 PYRIDYL-AMINE FUSED AZADECALIN MODULATORS CORCEPT THERAPEUTICS, INC. (US) 2012-03-01 WO claimed
US-20060194065-A1 Functional polymers via surface modifying agents, and methods for polymeric surface modification THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF THE NAVY 2006-08-31 US claimed
EP-3438146-B1 CYANIC ACID ESTER COMPOUND AND METHOD FOR PRODUCING SAME, RESIN COMPOSITION, CURED ARTICLE, PREPREG, SEALING MATERIAL, FIBER-REINFORCED COMPOSITE MATERIAL, ADHESIVE AGENT, METAL FOIL-CLAD LAMINATE PLATE, RESIN SHEET, AND PRINTED WIRING BOARD MITSUBISHI GAS CHEMICAL CO (JP) 2026-04-08 EP disclosed
US-20260047004-A1 METHOD FOR PRODUCING METAL FOIL-CLAD LAMINATE, RESIN COMPOSITION, RESIN COMPOSITE SHEET, METHOD FOR PRODUCING PRINTED WIRING BOARD, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2026-02-12 US disclosed
US-12534617-B2 Resin composition, cured product, prepreg, metal foil-clad laminate, resin sheet, and printed wiring board MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-01-27 US disclosed
US-12516139-B2 Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-01-06 US disclosed
EP-3845575-B1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2025-12-10 EP disclosed
US-12486371-B2 Thermally curable resin composition, cured object, resin sheet, prepreg, metal-clad laminate, multilayered printed wiring board, sealing material, fiber-reinforced composite material, adhesive, and semiconductor device NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2025-12-02 US disclosed
EP-4610287-A1 RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL FOIL-CLAD LAMINATE, RESIN COMPOSITE SHEET, AND PRINTED WIRING BOARD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-09-03 EP disclosed
EP-4610285-A1 RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL FOIL-CLAD LAMINATE, RESIN COMPOSITE SHEET, AND PRINTED WIRING BOARD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-09-03 EP disclosed
US-20020068237-A1 Negative photosensitive resin composition, negative photosensitive dry film and method of forming pattern KANSAI PAINT CO., LTD. (JP) 2002-06-06 US disclosed
EP-1201638-A1 PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND NIPPON SODA CO., LTD. (JP) 2002-05-02 EP disclosed
US-6313188-B1 USED AS CATALYSTS FOR CATIONIC PHOTOPOLYMERIZATION NIPPON SODA CO., LTD. (JP) 2001-11-06 US disclosed
EP-1106639-A1 PHOTOCURABLE COMPOSITION CONTAINING IODONIUM SALT COMPOUND NIPPON SODA CO., LTD. (JP) 2001-06-13 EP disclosed
US-6140025-A Negative type photosensitive resin composition and method for forming resist pattern KANSAI PAINT CO., LTD. (JP) 2000-10-31 US disclosed
US-6106999-A SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS MITSUI CHEMICALS (JP) 2000-08-22 US disclosed
EP-0927726-A1 PHOTOCATALYTIC COMPOSITION NIPPON SODA CO., LTD. (JP) 1999-07-07 EP disclosed
WO-1997003105-A1 PREPARATION OF CYCLIC OLIGOMERS OF SUBSTITUTED CYCLIC ETHERS THE SECRETARY OF STATE FOR DEFENCE (GB) 1997-01-30 WO disclosed