SCHEMBL3753324

SCHEMBL3753324

O=C(CC(=O)N1CCOCC1)N1CCOCC1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.64
TSHR P16473 3/20 0.58
ALOX15 P16050 1/20 0.58
HSD17B10 Q99714 1/20 0.58
GLA P06280 1/20 0.55
HTT P42858 1/20 0.54
SMN1; SMN2 Q16637 2/20 0.52
CA12 O43570 1/20 0.52
CA1 P00915 1/20 0.52
CA9 Q16790 1/20 0.52
POLB P06746 2/20 0.52
GAA P10253 1/20 0.52
LMNA P02545 1/20 0.50
MEN1 O00255 1/20 0.50
TP53 P04637 1/20 0.50
KMT2A Q03164 1/20 0.50
FKBP1A P62942 1/20 0.48
ALDH1A1 P00352 1/20 0.48
MMP1 P03956 1/20 0.48
MMP3 P08254 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13522679 0.97 L3MBTL1 (0.61) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL7380670 0.88 L3MBTL1 (0.57) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL294991 0.86 SMN1; SMN2 (0.56) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL3466247 0.86 L3MBTL1 (0.55) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL7341605 0.86 L3MBTL1 (0.55) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL2418238 0.86 SMN1; SMN2 (0.56) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL18279547 0.84 L3MBTL1 (0.53) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL18279545 0.84 L3MBTL1 (0.53) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL15821655 0.83 L3MBTL1 (0.52) L3MBTL1TSHRALOX15HSD17B10GLA
SCHEMBL7275713 0.83 GLA (0.69) L3MBTL1TSHRALOX15HSD17B10GLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005705-B2 Method for the production of a substrate having a coating comprising copper, and coated substrate and device prepared by this method FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2015-04-14 US disclosed
US-8507038-B2 Substrate having a coating comprising copper and method for the production thereof by means of atomic layer deposition FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 2013-08-13 US disclosed
US-20130062768-A1 METHOD FOR THE PRODUCTION OF A SUBSTRATE HAVING A COATING COMPRISING COPPER, AND COATED SUBSTRATE AND DEVICE PREPARED BY THIS METHOD TECHNISCHE UNIVERSITAET CHEMNITZ (DE) 2013-03-14 US disclosed
US-20100301478-A1 Substrate Having a Coating Comprising Copper and Method for the Production Thereof by Means of Atomic Layer Deposition TECHNISCHE UNIVERSITAET CHEMNITZ (DE) 2010-12-02 US disclosed