SCHEMBL3754477

SCHEMBL3754477

O=S(=O)(O)C(F)(F)C(F)(F)OC(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6129888 0.89 ALDH1A1 (0.38) ALDH1A1L3MBTL1
SCHEMBL6285143 0.89
SCHEMBL14228108 0.82 ALDH1A1 (0.33) ALDH1A1L3MBTL1
SCHEMBL890672 0.82 ALDH1A1 (0.33) ALDH1A1L3MBTL1
SCHEMBL6287023 0.82 ALDH1A1 (0.33) ALDH1A1L3MBTL1
SCHEMBL30399960 0.82 ALDH1A1 (0.33) ALDH1A1L3MBTL1
SCHEMBL6286099 0.80 ALDH1A1 (0.32) ALDH1A1L3MBTL1
SCHEMBL6284822 0.80 ALDH1A1 (0.32) ALDH1A1L3MBTL1
SCHEMBL6129813 0.80 ALDH1A1 (0.32) ALDH1A1L3MBTL1
SCHEMBL6285295 0.80 ALDH1A1 (0.32) ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240291009-A1 METHOD FOR PURIFYING TREATMENT TARGET SOLUTION AGC Inc. (JP) 2024-08-29 US disclosed
EP-4417582-A1 METHOD FOR PURIFYING TREATMENT TARGET SOLUTION AGC Inc. (JP) 2024-08-21 EP disclosed
CN-118176168-A Method for purifying liquid to be treated AGC株式会社 2024-06-11 CN disclosed
US-11898123-B2 Cleaning compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2024-02-13 US disclosed
EP-4204490-A1 CLEANING COMPOSITIONS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2023-07-05 EP disclosed
WO-2023063339-A1 METHOD FOR PURIFYING TREATMENT TARGET SOLUTION AGC株式会社 2023-04-20 WO disclosed
US-20220145221-A1 Cleaning Compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2022-05-12 US disclosed
US-20220064575-A1 Cleaning Compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2022-03-03 US disclosed
EP-3774680-A1 CLEANING COMPOSITIONS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2021-02-17 EP disclosed
US-20200332231-A1 Cleaning Compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2020-10-22 US disclosed
WO-2013059806-A1 Novel Passivation Composition and Process FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2013-04-25 WO disclosed
WO-2012125401-A1 NOVEL ETCHING COMPOSITION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2012-09-20 WO disclosed
US-20120231632-A1 Novel Etching Composition FUJIFILM CORPORATION (JP) 2012-09-13 US disclosed
US-20100304299-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2010-12-02 US disclosed
US-6855476-B2 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. (US) 2005-02-15 US disclosed
US-20020197558-A1 Photoacid generators for use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. 2002-12-26 US disclosed
EP-0466483-B1 Process for preparing perfluoroalkoxysulphonic compounds AUSIMONT SPA (IT) 1995-10-11 EP disclosed
US-5374770-A Polymerization catalysts, surfactants, electrolytes AUSIMONT S.P.A. (IT) 1994-12-20 US disclosed
US-5241110-A Reacting perfluorovinylsulfonyl fluoride with a hypofluorite; polymeric perfluoroether units possible; AUSIMONT S.P.A. (IT) 1993-08-31 US disclosed
EP-0466483-A1 Process for preparing perfluoroalkoxysulphonic compounds AUSIMONT S.p.A. (IT) 1992-01-15 EP disclosed