SCHEMBL3758300

SCHEMBL3758300

CCCCn1c(=O)n(CCCC)c(=O)n(CCC(=O)O)c1=O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APEX1 P27695 1/20 0.55
PDE4A P27815 2/20 0.47
PDE4B Q07343 1/20 0.47
PDE4C Q08493 1/20 0.47
PDE4D Q08499 1/20 0.47
AKR1B1 P15121 1/20 0.46
GPR84 Q9NQS5 7/20 0.45
PPARG P37231 6/20 0.45
PPARD Q03181 6/20 0.45
PPARA Q07869 6/20 0.45
HDAC11 Q96DB2 5/20 0.45
TSHR P16473 4/20 0.45
ALDH1A1 P00352 2/20 0.45
TLR2 O60603 2/20 0.45
TDP1 Q9NUW8 2/20 0.45
FABP4 P15090 2/20 0.45
PTPN1 P18031 2/20 0.45
SLC22A6 Q4U2R8 1/20 0.45
SLC22A8 Q8TCC7 1/20 0.45
MEN1 O00255 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22344830 1.00 APEX1 (0.55) APEX1PDE4APDE4BPDE4CPDE4D
SCHEMBL24682710 0.92 GPR84 (0.52) APEX1PDE4AAKR1B1GPR84PPARG
SCHEMBL22344833 0.92 GPR84 (0.52) APEX1PDE4AAKR1B1GPR84PPARG
SCHEMBL24682715 0.92 GPR84 (0.52) APEX1PDE4AAKR1B1GPR84PPARG
SCHEMBL29251518 0.88 APEX1 (0.77) APEX1PDE4APDE4BPDE4CPDE4D
SCHEMBL13510591 0.88 APEX1 (0.59) APEX1PDE4APDE4BPDE4CPDE4D
SCHEMBL113643 0.85 APEX1 (0.71) APEX1PDE4APDE4BPDE4CPDE4D
SCHEMBL30976969 0.84 KDM4E (0.51) APEX1PDE4APDE4BPDE4CPDE4D
SCHEMBL3774169 0.83 APEX1 (0.59) APEX1PDE4APDE4BPDE4CPDE4D
SCHEMBL10329438 0.83 APEX1 (0.59) APEX1PDE4APDE4BPDE4CPDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7846638-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-07 US disclosed
EP-1560070-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2009-12-30 EP disclosed
US-7425399-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-09-16 US disclosed
US-20080206680-A1 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-08-28 US disclosed
US-20060290429-A1 Composition form forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2006-12-28 US disclosed
EP-1560070-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2005-08-03 EP disclosed