SCHEMBL3760145

SCHEMBL3760145

Cn1c(=O)n(C)c(=O)n(CCC(=O)O)c1=O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APEX1 P27695 2/20 0.55
ALDH1A1 P00352 3/20 0.47
PKM P14618 1/20 0.47
MAPT P10636 1/20 0.46
HTT P42858 2/20 0.43
FABP3 P05413 1/20 0.42
FABP4 P15090 1/20 0.42
FABP5 Q01469 1/20 0.42
ACE P12821 1/20 0.41
KDM4E B2RXH2 3/20 0.40
CMA1 P23946 3/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
PDE4A P27815 1/20 0.40
PDE4B Q07343 1/20 0.40
PDE4C Q08493 1/20 0.40
PDE4D Q08499 1/20 0.40
POLB P06746 1/20 0.39
HSD17B10 Q99714 1/20 0.39
CTSG P08311 1/20 0.38
HPGD P15428 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10329437 0.95 APEX1 (0.61) APEX1ALDH1A1PKMMAPTHTT
SCHEMBL839061 0.88 APEX1 (0.53) APEX1ALDH1A1PKMMAPTFABP3
SCHEMBL3771053 0.87 FABP4 (0.46) APEX1ALDH1A1HTTFABP4FABP5
SCHEMBL113643 0.85 APEX1 (0.71) APEX1ALDH1A1PKMMAPTHTT
SCHEMBL30976974 0.83 APEX1 (0.47) APEX1FABP4FABP5KDM4EHSD17B10
SCHEMBL10329438 0.80 APEX1 (0.59) APEX1ALDH1A1PKMMAPTHTT
SCHEMBL3774169 0.80 APEX1 (0.59) APEX1ALDH1A1PKMMAPTHTT
SCHEMBL13510591 0.80 APEX1 (0.59) APEX1ALDH1A1PKMMAPTFABP3
SCHEMBL28998298 0.80 APEX1 (0.59) APEX1ALDH1A1PKMMAPTHTT
SCHEMBL3767521 0.79 HTT (0.53) APEX1ALDH1A1HTTACEKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7846638-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-07 US disclosed
EP-1560070-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2009-12-30 EP disclosed
US-7425399-B2 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-09-16 US disclosed
US-20080206680-A1 Composition for forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-08-28 US disclosed
US-20060290429-A1 Composition form forming anti-reflective coating for use in lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2006-12-28 US disclosed
EP-1560070-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2005-08-03 EP disclosed