SCHEMBL3762369

SCHEMBL3762369

Cc1cc(C)c(S(=O)(=O)[O-])c(C)c1.Cc1ccc([I+]c2ccc(CC(C)C)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NR3C1 P04150 10/20 0.49
NR3C2 P08235 8/20 0.49
PGR P06401 7/20 0.49
RAPGEF4 Q8WZA2 1/20 0.42
KDM4E B2RXH2 2/20 0.41
POLB P06746 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ALDH1A1 P00352 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3764391 0.85 ALDH1A1 (0.45) KDM4EPOLBSMN1; SMN2ALDH1A1
SCHEMBL3756956 0.83 BCHE (0.40) NR3C1NR3C2PGRKDM4EPOLB
SCHEMBL7892650 0.80 GAA (0.41) KDM4EPOLBSMN1; SMN2ALDH1A1
SCHEMBL361556 0.80 PTGS1 (0.40) ALDH1A1
SCHEMBL3759101 0.79 BCHE (0.45) KDM4EPOLBSMN1; SMN2ALDH1A1
SCHEMBL3756890 0.79 BCHE (0.45) KDM4EPOLBSMN1; SMN2ALDH1A1
SCHEMBL4623956 0.78 ALDH1A1 (0.39) NR3C1NR3C2PGRKDM4EPOLB
Hydrochloric Acid SCHEMBL31093481 0.78 PTGS1 (0.39) KDM4EPOLBSMN1; SMN2ALDH1A1
Phosphoric Acid SCHEMBL29961189 0.77 ALDH1A1 (0.38) KDM4EPOLBSMN1; SMN2ALDH1A1
SCHEMBL3759299 0.77 ALDH1A1 (0.47) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070225395-A1 Thermally stable cationic photocurable compositions WOLF JEAN-PIERRE 2007-09-27 US claimed
US-20050165141-A1 Thermally stable cationic photocurable compositions CIBA SPECIALTY CHEMICALS CORP. 2005-07-28 US claimed
EP-2076563-B1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS BASF SE (DE) 2016-08-17 EP disclosed
US-8084522-B2 Thermally stable cationic photocurable compositions BASF SE (DE) 2011-12-27 US disclosed
US-20100304284-A1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS IGM GROUP B.V. (NL) 2010-12-02 US disclosed
EP-2076563-A1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS Ciba Holding Inc. (CH) 2009-07-08 EP disclosed
WO-2008049743-A1 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS CIBA HOLDING INC. (CH) 2008-05-02 WO disclosed
US-20070225395-A1 Thermally stable cationic photocurable compositions WOLF JEAN-PIERRE 2007-09-27 US disclosed
EP-1709099-A2 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS Ciba Specialty Chemicals Holding Inc. (CH) 2006-10-11 EP disclosed
WO-2005070989-A2 THERMALLY STABLE CATIONIC PHOTOCURABLE COMPOSITIONS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-08-04 WO disclosed
US-20050165141-A1 Thermally stable cationic photocurable compositions CIBA SPECIALTY CHEMICALS CORP. 2005-07-28 US disclosed
US-20010036591-A1 Iodonium salts as latent acid donors IGM GROUP B.V. (NL) 2001-11-01 US disclosed
US-6306555-B1 RADIATION-SENSITIVE COMPOSITION COMPRISING CATIONICALLY OR ACID-CATALYTICALLY POLYMERISABLE OR CROSSLINKABLE COMPOUND OR COMPOUND THAT INCREASES ITS SOLUBILITY IN DEVELOPER UNDER ACTION OF ACID, AND AT LEAST ONE DIARYLIODONIUM SALT CIBA SPECIALTY CHEMICALS CORP. 2001-10-23 US disclosed