SCHEMBL3769669

SCHEMBL3769669

COC(=O)c1ccc(C(=O)O)nc1C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 8/20 0.49
L3MBTL1 Q9Y468 3/20 0.49
MAPK1 P28482 2/20 0.49
NPSR1 Q6W5P4 1/20 0.42
TSHR P16473 3/20 0.41
TDP1 Q9NUW8 2/20 0.41
ALOX15 P16050 1/20 0.41
ACMSD Q8TDX5 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA7 P43166 1/20 0.41
PDK2 Q15119 1/20 0.41
PDK4 Q16654 1/20 0.41
CA9 Q16790 1/20 0.41
CA14 Q9ULX7 1/20 0.41
LMNA P02545 1/20 0.39
ALDH1A1 P00352 3/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16163918 0.84 KDM4E (0.42) KDM4EL3MBTL1MAPK1NPSR1TSHR
SCHEMBL20773666 0.82 NPC1 (0.42) KDM4EL3MBTL1NPSR1TSHRTDP1
SCHEMBL31003881 0.81 TDP1 (0.53) KDM4EL3MBTL1MAPK1TSHRTDP1
SCHEMBL22660201 0.81 TDP1 (0.53) KDM4EL3MBTL1MAPK1TSHRTDP1
SCHEMBL30521020 0.81 KDM4E (0.50) KDM4EL3MBTL1NPSR1TSHRTDP1
SCHEMBL2585576 0.81 KDM4E (0.50) KDM4EL3MBTL1NPSR1TSHRTDP1
SCHEMBL8137479 0.79 KDM4E (0.46) KDM4EL3MBTL1MAPK1TSHRTDP1
Hydrochloric Acid SCHEMBL11152148 0.79 KDM4E (0.48) KDM4EL3MBTL1NPSR1TSHRTDP1
SCHEMBL28569322 0.79 KDM4E (0.53) KDM4EL3MBTL1MAPK1NPSR1TSHR
SCHEMBL31432467 0.77 KDM4E (0.47) KDM4EL3MBTL1MAPK1NPSR1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7843045-B2 Thermoplastic resin composition for semiconductor, adhesion film, lead frame, and semiconductor device using the same, and method of producing semiconductor device HITACHI CHEMICAL CO., LTD. (JP) 2010-11-30 US disclosed
US-7560307-B2 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-07-14 US disclosed
US-20090091012-A1 THERMOPLASTIC RESIN COMPOSITION FOR SEMICONDUCTOR, ADHESION FILM, LEAD FRAME, AND SEMICONDUCTOR DEVICE USING THE SAME, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE HITACHI CHEMICAL CO., LTD. (JP) 2009-04-09 US disclosed
CN-100467539-C Electroconductive resin composition and electronic parts using the same HITACHI CHEMICAL CO LTD (JP) 2009-03-11 CN disclosed
CN-100460467-C Conductive resin composition and electronic component using same HITACHI CHEMICAL CO LTD (JP) 2009-02-11 CN disclosed
CN-1325558-C Paste composition, and protective film and semiconductor device both obtained with the same HITACHI CHEMICAL CO LTD (JP) 2007-07-11 CN disclosed
CN-1876717-A Electroconductive resin composition and electronic parts using the same HITACHI CHEMICAL CO LTD (JP) 2006-12-13 CN disclosed
CN-1286918-C Resin compon, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof HITACHI CHEMICAL CO LTD (JP) 2006-11-29 CN disclosed
US-20060180908-A1 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same YANO YASUHIRO 2006-08-17 US disclosed
US-7061081-B2 Comprises polyamideetherimide or polyether amide; for use as coating material, adhesive and stress releasing material; controlled elasticity; dielectrics; electronics HITACHI CHEMICAL CO., LTD. (JP) 2006-06-13 US disclosed
CN-1416452-A Resin compon, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof HITACHI CHEMICAL CO LTD (JP) 2003-05-07 CN disclosed
US-20030082925-A1 Comprises polyamideetherimide or polyether amide; for use as coating material, adhesive and stress releasing material; controlled elasticity; dielectrics; electronics HITACHI CHEMICAL CO., LTD. (JP) 2003-05-01 US disclosed
US-6492203-B1 Semiconductor device and method of fabrication thereof HITACHI CHEMICAL COMPANY, LTD. (JP) 2002-12-10 US disclosed
US-6404068-B1 (A) A THERMOPLASTIC RESIN, (B) AN EPOXY RESIN, (C) A COUPLING AGENT, (D) A POWDERY INORGANIC FILLER, (E) A POWDER HAVING RUBBER ELASTICITY AND (F) AN ORGANIC SOLVENT; LOW WATER VAPOR PERMEABILITY HITACHI CHEMICAL COMPANY, LTD. (JP) 2002-06-11 US disclosed
CN-1313882-A Paste composition, protective film using the same, and semiconductor device HITACHI CHEMICAL CO LTD (JP) 2001-09-19 CN disclosed
EP-1114845-A1 PASTE COMPOSITION, AND PROTECTIVE FILM AND SEMICONDUCTOR DEVICE BOTH OBTAINED WITH THE SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2001-07-11 EP disclosed
US-5212279-A Hot-melt adhesive and its use in polyimide film and printed circuit board HITACHI CHEMICAL CO., LTD. (JP) 1993-05-18 US disclosed
EP-0017422-B1 THERMOPLASTIC POLYAMIDEIMIDE COPOLYMERS AND METHOD OF PREPARATION TORAY INDUSTRIES, INC. (JP) 1983-11-30 EP disclosed
US-4299945-A HEAT POLYMERIZATION OF AN AROMATIC DIAMINO COMPOUND AND AN AROMATIC TRIBASIC CARBOXYLIC ACID TORAY INDUSTRIES, INC. (JP) 1981-11-10 US disclosed
EP-0017422-A1 Thermoplastic polyamideimide copolymers and method of preparation TORAY INDUSTRIES, INC. (JP) 1980-10-15 EP disclosed