Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | ABL1 | P00519 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | ALPI | P09923 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | ALPG | P10696 | 1/20 | 0.30 |
| ▸ | APEX1 | P27695 | 1/20 | 0.30 |
| ▸ | CASP3 | P42574 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | BLM | P54132 | 1/20 | 0.30 |
| ▸ | CASP7 | P55210 | 1/20 | 0.30 |
| ▸ | CASP6 | P55212 | 1/20 | 0.30 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.30 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3762507 | 0.87 | CAMK2A (0.41) | — | |
| SCHEMBL5355933 | 0.77 | CAMK2A (0.32) | — | |
| SCHEMBL624969 | 0.65 | TDP1 (0.36) | ALDH1A1TDP1 | |
| SCHEMBL16661 | 0.64 | — | — | |
| SCHEMBL7758820 | 0.64 | TET2 (0.40) | — | |
| SCHEMBL806469 | 0.64 | — | — | |
| SCHEMBL21794807 | 0.63 | — | — | |
| SCHEMBL22881137 | 0.63 | TDP1 (0.43) | KDM4ETDP1 | |
| SCHEMBL35589 | 0.62 | — | — | |
| SCHEMBL4532573 | 0.62 | TET2 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4855215-A | Photosetting polymer composition | UBE INDUSTRIES, LTD. (JP) | 1989-08-08 | — | — | US | claimed |
| CN-114245881-A | Photosensitive resin composition | 日产化学株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-112639618-A | Negative photosensitive resin composition | 日产化学株式会社 | 2021-04-09 | — | — | CN | disclosed |
| WO-2021024928-A1 | RESIN COMPOSITION | 日産化学株式会社 | 2021-02-11 | — | — | WO | disclosed |
| WO-2021014956-A1 | PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2021-01-28 | — | — | WO | disclosed |
| CN-105765458-B | Negative photosensitive resin composition | 日产化学工业株式会社 | 2020-12-29 | — | — | CN | disclosed |
| CN-111684358-A | Photosensitive resin composition | 日产化学株式会社 | 2020-09-18 | — | — | CN | disclosed |
| WO-2020044918-A1 | NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2020-03-05 | — | — | WO | disclosed |
| CN-110573963-A | Photosensitive resin composition | 日产化学株式会社 | 2019-12-13 | — | — | CN | disclosed |
| WO-2019156000-A1 | PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2019-08-15 | — | — | WO | disclosed |
| US-7851124-B2 | Composition for forming wiring protective film and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2010-12-14 | — | — | US | disclosed |
| US-7030170-B2 | Photosensitive resin composition, dry film, and workpiece using the same | MITSUI CHEMICALS, INC. (JP) | 2006-04-18 | — | — | US | disclosed |
| US-20050170270-A1 | Composition for forming wiring protective film and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20040247908-A1 | Composition for forming wiring protective film and uses thereof | MITSUI CHEMICALS, INC. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20030176528-A1 | Photosensitive resin composition, dry film, and workpiece using the same | MITSUI CHEMICALS, INC. (JP) | 2003-09-18 | — | — | US | disclosed |
| US-4855215-A | Photosetting polymer composition | UBE INDUSTRIES, LTD. (JP) | 1989-08-08 | — | — | US | disclosed |
| US-4595745-A | Polycondensation product of aromatic dicarboxylic acid component comprising acids and acid halides with organic diamine comprising diamino chalcone and ester or ether containing diamine and nonphotocrosslinkable diamine | UBE INDUSTRIES, LTD. (JP) | 1986-06-17 | — | — | US | disclosed |
| US-4558117-A | Organic solvent-soluble photosensitive polyimide resin | UBE INDUSTRIES, LTD. (JP) | 1985-12-10 | — | — | US | disclosed |