SCHEMBL3778038

SCHEMBL3778038

CCO[Ti](C)(C)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10773387 0.75
SCHEMBL963940 0.75
SCHEMBL35278 0.70
SCHEMBL1142306 0.69
SCHEMBL4467261 0.69
SCHEMBL18528757 0.65 ALDH1A1 (0.30)
SCHEMBL4301107 0.64
SCHEMBL5057175 0.64
SCHEMBL495675 0.64
SCHEMBL4301597 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11692093-B2 Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding Konica Minolta, Inc. (JP) 2023-07-04 US disclosed
US-20220206404-A1 HUMAN BODY-SAFE EXTERNAL ADDITIVE FOR TONER AND TONER MANUFACTURED USING SAME Sukgyung AT Co., Ltd. (KR) 2022-06-30 US disclosed
US-11181844-B2 Toner and method of producing toner CANON KABUSHIKI KAISHA (JP) 2021-11-23 US disclosed
US-20200379363-A1 TONER AND METHOD OF PRODUCING TONER CANON KABUSHIKI KAISHA (JP) 2020-12-03 US disclosed
US-20200263023-A1 RESIN COMPOSITION, METHOD FOR PRODUCING THREE-DIMENSIONAL MOLDING USING SAME, AND THREE-DIMENSIONAL MOLDING Konica Minolta, Inc. (JP) 2020-08-20 US disclosed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
CN-108026652-B Metal foil, metal foil with release layer, laminate, printed wiring board, semiconductor package, electronic device, and method for manufacturing printed wiring board JX金属株式会社 2019-10-25 CN disclosed
CN-110099518-A The preparation method of resin base material, the preparation method of printing distributing board, the preparation method of the preparation method of printed circuit board and e-machine JX日矿日石金属株式会社 2019-08-06 CN disclosed
CN-104685980-B The manufacturing method and base substrate of multilayer printed wiring board JX日矿日石金属株式会社 2018-11-23 CN disclosed
CN-108696998-A The copper foil of attached release layer, the manufacturing method of laminate, the manufacturing method of printing distributing board and e-machine JX金属株式会社 2018-10-23 CN disclosed
US-20140202531-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE MEMBER AND PRODUCTION METHOD THEREOF, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-07-24 US disclosed
US-20140069488-A1 CONDUCTIVE MEMBER, METHOD OF PRODUCING THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-03-13 US disclosed
US-20140048131-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
CN-102040687-B Catalyst component for ethylene polymerization and catalyst thereof CHINA PETROLEUM & CHEMICAL 2013-09-25 CN disclosed
US-8248685-B2 Display particles for image display apparatus and image display apparatus loaded with the same KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2012-08-21 US disclosed
CN-102040687-A Catalyst component for ethylene polymerization and catalyst thereof NANNAN CUI 2011-05-04 CN disclosed
US-20100321762-A1 DISPLAY PARTICLES FOR IMAGE DISPLAY APPARATUS AND IMAGE DISPLAY APPARATUS LOADED WITH THE SAME KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2010-12-23 US disclosed
CN-101724103-A Preparation method of catalyst component for ethylene polymerization CHINA PETROLEUM & CHEMICAL 2010-06-09 CN disclosed
US-5627244-A SOLVENT RESISTANT POLYMETHACRYLATE SUMITOMO CHEMICAL CO., LTD. (JP) 1997-05-06 US disclosed