⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17581922 | 0.79 | — | — | |
| SCHEMBL126160 | 0.76 | — | — | |
| SCHEMBL26111003 | 0.76 | MEN1 (0.32) | — | |
| SCHEMBL26109590 | 0.76 | MEN1 (0.32) | — | |
| SCHEMBL26108451 | 0.76 | MEN1 (0.32) | — | |
| SCHEMBL26115314 | 0.76 | MEN1 (0.32) | — | |
| SCHEMBL6524926 | 0.72 | — | — | |
| SCHEMBL3780292 | 0.72 | ALDH1A1 (0.39) | — | |
| SCHEMBL29300033 | 0.70 | HSD17B10 (0.48) | — | |
| SCHEMBL128128 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7858288-B2 | Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20080268376-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-30 | — | — | US | disclosed |