Nitrous Acid

Nitrous Acid

SCHEMBL3781144

NCC(Cl)CCCCCl.O=NO

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5476009 0.87
SCHEMBL28732089 0.84 ALDH1A1 (0.33)
SCHEMBL28634280 0.84 ALDH1A1 (0.33)
SCHEMBL5147841 0.82
Hydrochloric Acid SCHEMBL2968465 0.79
SCHEMBL15227661 0.70 ALDH1A1 (0.30)
SCHEMBL16136743 0.69
SCHEMBL29105368 0.69 TSHR (0.40)
SCHEMBL497040 0.67
SCHEMBL6553635 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-1163284-A None JP disclosed
US-9873252-B2 Printing device and printing method RICOH COMPANY, LTD. (JP) 2018-01-23 US disclosed
US-9868288-B2 Cleaning liquid for inkjet recording apparatus, method for cleaning inkjet recording apparatus, recording method, and cleaning and filling liquid RICOH COMPANY, LTD. (JP) 2018-01-16 US disclosed
US-20170182770-A1 PRINTING DEVICE AND PRINTING METHOD RICOH COMPANY, LTD. (JP) 2017-06-29 US disclosed
EP-3184307-A1 PRINTING DEVICE AND PRINTING METHOD Ricoh Company, Ltd. (JP) 2017-06-28 EP disclosed
US-20170015102-A1 CLEANING LIQUID FOR INKJET RECORDING APPARATUS, METHOD FOR CLEANING INKJET RECORDING APPARATUS, RECORDING METHOD, AND CLEANING AND FILLING LIQUID RICOH COMPANY, LTD. (JP) 2017-01-19 US disclosed
US-7847406-B2 Solder alloy material layer composition, electroconductive and adhesive composition, flux material layer composition, solder ball transferring sheet, bump and bump forming process, and semiconductore device RICOH COMPANY, LTD. (JP) 2010-12-07 US disclosed
US-7059512-B2 Solder alloy material layer composition, electroconductive and adhesive composition, flux material layer composition, solder ball transferring sheet, bump and bump forming process, and semiconductor device RICOH COMPANY, LTD. (JP) 2006-06-13 US disclosed
US-20060011703-A1 Solder alloy material layer composition, electroconductive and adhesive composition, flux material layer composition, solder ball transferring sheet, bump and bump forming process, and semiconductore device ARITA HITOSHI 2006-01-19 US disclosed
US-20040129344-A1 Semiconductor device with solder bumps with fewer occurrences of voids and cracks RICOH COMPANY, LTD. (JP) 2004-07-08 US disclosed
JP-H01163284-A TACKY ADHESIVE FILM FOR CORROSION-PROTECTION OF STEEL PLATE MARUNAGA KK 1989-06-27 JP disclosed