SCHEMBL3786376

SCHEMBL3786376

C[CH]CC(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9188953 0.74 HTR2A (0.48)
SCHEMBL9188946 0.74 HTR2A (0.48)
SCHEMBL466778 0.73
SCHEMBL466779 0.73
SCHEMBL7741970 0.71
SCHEMBL2398503 0.69
SCHEMBL24178 0.69
SCHEMBL7714133 0.69
SCHEMBL497180 0.69
SCHEMBL12327087 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115340537-A Quinazoline compound, preparation method and application thereof 上海医药集团股份有限公司 2022-11-15 CN disclosed
CN-113698905-A Flame-retardant silane modified polyether sealant containing DOPO and preparation method thereof 河北厚丰有机硅制品股份有限公司 2021-11-26 CN disclosed
US-9921498-B2 Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 2018-03-20 US disclosed
CN-106749377-A A kind of N, N are double(Trimethyl silyl)Allyl amine and preparation method thereof 湖北新蓝天新材料股份有限公司 2017-05-31 CN disclosed
US-20160377998-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS CANON KABUSHIKI KAISHA (JP) 2016-12-29 US disclosed
CN-102149373-B 1-amino-alkylcyclohexane derivatives for the treatment of inflammatory skin diseases MERZ PHARMA GMBH & CO KGAA 2012-10-10 CN disclosed
CN-102149373-A 1-amino-alkylcyclohexane derivatives for the treatment of inflammatory skin diseases MERZ PHARMA GMBH & CO KG 2011-08-10 CN disclosed
US-20100087680-A1 METHOD FOR PRODUCING BIARYL COMPOUND SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2010-04-08 US disclosed
EP-1914221-A1 PROCESS FOR PRODUCING BIARYL COMPOUND Sumitomo Chemical Company, Limited (JP) 2008-04-23 EP disclosed
CN-1066448-C Amide derivatives OTSUKA PHARMA CO LTD (JP) 2001-05-30 CN disclosed
CN-1221419-A Amide derivatives OTSUKA PHARMA CO LTD (JP) 1999-06-30 CN disclosed