SCHEMBL3786753

SCHEMBL3786753

Fc1[c]c(F)c(F)c(F)[c]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20526424 0.67
SCHEMBL1446050 0.67
SCHEMBL4083003 0.67
SCHEMBL21333947 0.67
SCHEMBL9158859 0.67
SCHEMBL6660580 0.62
SCHEMBL395705 0.62
SCHEMBL8721894 0.62
SCHEMBL5508757 0.62
SCHEMBL2346933 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1335690-A4 IN-SITU BONDS PRAXIS LLC (US) 2004-03-31 EP claimed
EP-1335690-A2 IN-SITU BONDS Praxis LLC (US) 2003-08-20 EP claimed
WO-2002026848-A2 IN-SITU BONDS PRAXIS LLC (US) 2002-04-04 WO claimed
JP-11236449-A None JP disclosed
JP-11236450-A None JP disclosed
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 US disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
CN-116157382-A Material for metal patterning, amine compound, electronic device, and method for forming metal pattern 东曹株式会社 2023-05-23 CN disclosed
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 WO disclosed
US-9951164-B2 Non-ionic aryl ketone based polymeric photo-acid generators INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2018-04-24 US disclosed
US-20180044459-A1 NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS CENTRAL GLASS CO., LTD. (JP) 2018-02-15 US disclosed
EP-1442067-B1 SOLID COCATALYST COMPONENT FOR OLEFIN POLYMERIZATION AND CATALYST SYSTEM THEREOF SUNALLOMER LTD (JP) 2007-04-18 EP disclosed
US-7005398-B2 Olefin polymerization catalyst, catalyst component for olefin polymerization, method of storing these, and process for producing olefin polymer SUNALLOMER LTD. (JP) 2006-02-28 US disclosed
US-20050009689-A1 Solid cocatalyst component for olefin polymerization and catalyst system thereof SUNALLOMER LTD. (JP) 2005-01-13 US disclosed
EP-1442067-A1 SOLID COCATALYST COMPONENT FOR OLEFIN POLYMERIZATION AND CATALYST SYSTEM THEREOF Sunallomer Ltd (JP) 2004-08-04 EP disclosed
US-20040054102-A1 Olefin polymerization catalyst, catalyst component for olefin polymerization, method of storing these, and process for producing olefin polymer SUNALLOMER LTD. (JP) 2004-03-18 US disclosed
EP-1359166-A1 OLEFIN POLYMERIZATION CATALYST, CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, METHOD OF STORING THESE, AND PROCESS FOR PRODUCING OLEFIN POLYMER Sunallomer Ltd (JP) 2003-11-05 EP disclosed
WO-2003035708-A1 SOLID COCATALYST COMPONENT FOR OLEFIN POLYMERIZATION AND CATALYST SYSTEM THEREOF SUNALLOMER LTD (JP) 2003-05-01 WO disclosed
JP-H11236449-A PRODUCTION OF FLUORINE-CONTAINING POLYBENZOXAZOLE-POLYIMIDE AND INTERLAYER INSULATION FILM FOR MULTILAYER INTERCONNECTION OF SEMICONDUCTOR SUMITOMO BAKELITE CO LTD 1999-08-31 JP disclosed
JP-H11236450-A PRODUCTION OF FLUORINE-CONTAINING POLYBENZOXAZOLE-POLYIMIDE AND INTERLAYER INSULATION FILM FOR MULTILAYER INTERCONNECTION OF SEMICONDUCTOR SUMITOMO BAKELITE CO LTD 1999-08-31 JP disclosed