⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7695201 | 0.94 | — | — | |
| SCHEMBL976278 | 0.72 | — | — | |
| SCHEMBL974987 | 0.72 | — | — | |
| SCHEMBL9866494 | 0.72 | — | — | |
| SCHEMBL974724 | 0.71 | — | — | |
| SCHEMBL452093 | 0.69 | — | — | |
| SCHEMBL2088 | 0.63 | — | — | |
| SCHEMBL6918 | 0.63 | — | — | |
| SCHEMBL395630 | 0.62 | — | — | |
| SCHEMBL2466994 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111417700-A | Polymerizable liquid crystal composition, liquid crystal display element, and polymerizable compound | DIC株式会社 | 2020-07-14 | — | — | CN | claimed |
| CN-111417700-B | Polymerizable liquid crystal composition, liquid crystal display element, and polymerizable compound | DIC株式会社 | 2024-01-30 | — | — | CN | disclosed |
| US-11326024-B2 | Polyamide resin, molded body, laminate, medical device, and polyamide resin production method | KANEKA CORPORATION (JP) | 2022-05-10 | — | — | US | disclosed |
| US-20210277183-A1 | POLYAMIDE RESIN, MOLDED BODY, LAMINATE, MEDICAL DEVICE, AND POLYAMIDE RESIN PRODUCTION METHOD | KANEKA CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| CN-111417700-A | Polymerizable liquid crystal composition, liquid crystal display element, and polymerizable compound | DIC株式会社 | 2020-07-14 | — | — | CN | disclosed |
| US-8367310-B2 | Pattern forming process and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20100209849-A1 | PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-6794530-B1 | 1,4-ADDITION OF MONOHYDRIC OR POLYHYDRIC ALCOHOLS TO ALPHA , BETA -UNSATURATED NITRILES | BASF AKTIENGESELLSCHAFT (DE) | 2004-09-21 | — | — | US | disclosed |
| EP-0934925-B1 | Process for the preparation of beta-alkoxy nitriles | BASF AG (DE) | 2002-09-25 | — | — | EP | disclosed |
| EP-0940405-B1 | Organosilicon compounds containing alkenyl groups | WACKER CHEMIE GMBH (DE) | 2002-03-13 | — | — | EP | disclosed |
| US-6335143-B1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2002-01-01 | — | — | US | disclosed |
| US-6252101-B1 | ADDITION-CONDENSATION POLYMER | WACKER-CHEMIE GMBH (DE) | 2001-06-26 | — | — | US | disclosed |
| EP-0940405-A1 | Organosilicon compounds containing alkenyl groups | Wacker-Chemie GmbH (DE) | 1999-09-08 | — | — | EP | disclosed |
| EP-0934925-A1 | Process for the preparation of beta-alkoxy nitriles | BASF AKTIENGESELLSCHAFT (DE) | 1999-08-11 | — | — | EP | disclosed |
| EP-0887706-A1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1998-12-30 | — | — | EP | disclosed |