SCHEMBL3797140

SCHEMBL3797140

CCCCOc1ccc(Nc2ccc(N)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.58
TDP1 Q9NUW8 2/20 0.53
TSHR P16473 2/20 0.53
NPC1 O15118 3/20 0.51
RAB9A P51151 3/20 0.51
KDM4E B2RXH2 2/20 0.51
MAPK1 P28482 1/20 0.50
ADAMTS5 Q9UNA0 1/20 0.50
ALOX15 P16050 1/20 0.49
GAA P10253 1/20 0.48
HPGD P15428 1/20 0.48
CA12 O43570 2/20 0.47
CA1 P00915 2/20 0.47
CA2 P00918 2/20 0.47
CA9 Q16790 2/20 0.47
CA7 P43166 1/20 0.47
LTA4H P09960 1/20 0.47
UNG P13051 2/20 0.47
TP53 P04637 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL49791 0.90 NPC1 (0.58) TDP1NPC1RAB9AKDM4EMAPK1
SCHEMBL31151862 0.90 NPC1 (0.58) TDP1NPC1RAB9AKDM4EMAPK1
SCHEMBL112238 0.88 TSHR (0.67) TDP1TSHRNPC1RAB9AKDM4E
SCHEMBL8324472 0.86 NPC1 (0.64) TSHRNPC1RAB9AADAMTS5GAA
SCHEMBL1128464 0.85 NR5A1 (0.63) TSHRNPC1RAB9ALTA4HUNG
SCHEMBL8962079 0.85 NR5A1 (0.63) TSHRNPC1RAB9ALTA4HUNG
SCHEMBL9638067 0.85 TSHR (0.76) NR4A1TDP1TSHRNPC1RAB9A
SCHEMBL11470886 0.85 NR5A1 (0.63) TSHRNPC1RAB9ALTA4HUNG
SCHEMBL294772 0.84 NR5A1 (0.62) TDP1TSHRNPC1RAB9AKDM4E
SCHEMBL14402937 0.83 DRD2 (0.56) NPC1RAB9AKDM4EADAMTS5GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1656551-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR Honeywell International Inc. (US) 2006-05-17 EP claimed
WO-2005019816-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR HONEYWELL INTERNATIONAL, INC. (US) 2005-03-03 WO claimed
US-20050042758-A1 Leak detection method using microencapsulated dye precursor HONEYWELL CORPORATION 2005-02-24 US claimed
US-8703092-B2 Type separation of single-walled carbon nanotubes via two-phase liquid extraction UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2014-04-22 US disclosed
US-20100166637-A1 Type Separation of Single-Walled Carbon Nanotubes via Two-Phase Liquid Extraction UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. 2010-07-01 US disclosed
WO-2008057070-A2 TYPE SEPARATION OF SINGLE-WALLED CARBON NANOTUBES VIA PHASE TRANSFER UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2008-05-15 WO disclosed
EP-1421447-A4 IMAGEABLE COMPOSITION CONTAINING INFRARED ABSORBER WITH COUNTER ANION DERIVED FROM A NON-VOLATILE ACID KODAK POLYCHROME GRAPHICS LLC (US) 2006-09-06 EP disclosed
US-7056639-B2 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid EASTMAN KODAK COMPANY (US) 2006-06-06 US disclosed
EP-1656551-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR Honeywell International Inc. (US) 2006-05-17 EP disclosed
US-6921620-B2 Acid curable composition of an acid generator; an infrared absorber; and optional colorant KODAK POLYCHROME GRAPHICS LLC (US) 2005-07-26 US disclosed
US-20050079439-A1 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid KODAK POLYCHROME GRAPHICS LLC (US) 2005-04-14 US disclosed
WO-2002094571-A1 A METHOD OF PREPARING AN INKJET INK IMAGED LITHOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS, L.L.C. (US) 2002-11-28 WO disclosed
US-4692397-A SUBSTRATE COATED WITH A DIAZONIUM SALT; COLORANT AND A POLYVINYL ACETAL RESIN; LITHOGRAPHIC PRINTING PLATES AMERICAN HOECHST CORPORATION (US) 1987-09-08 US disclosed
EP-0126875-B1 LIGHT-SENSITIVE POLYCONDENSATION PRODUCT WITH DIAZONIUM GROUPS, PROCESS FOR THE PREPARATION THEREOF AND LIGHT-SENSITIVE REGISTRATION MATERIAL WHICH CONTAINS THIS POLYCONDENSATION PRODUCT HOECHST AKTIENGESELLSCHAFT (DE) 1987-05-27 EP disclosed
US-4661432-A Light-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material containing this polycondensation product HOECHST AKTIENGESELLSCHAFT (DE) 1987-04-28 US disclosed
EP-0074580-B1 LIGHT-SENSITIVE POLYCONDENSATION PRODUCT COMPRISING DIAZONIUM GROUPS, AND LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREFROM HOECHST AKTIENGESELLSCHAFT (DE) 1986-12-03 EP disclosed
US-4492748-A Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith HOECHST AKTIENGESELLSCHAFT, A CORP. OF GERMANY (DE) 1985-01-08 US disclosed
EP-0126875-A1 Light-sensitive polycondensation product with diazonium groups, process for the preparation thereof and light-sensitive registration material which contains this polycondensation product HOECHST AKTIENGESELLSCHAFT (DE) 1984-12-05 EP disclosed
EP-0074580-A2 Light-sensitive polycondensation product comprising diazonium groups, and light-sensitive recording material made therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1983-03-23 EP disclosed
US-4186017-A Light-sensitive copying composition HOECHST AKTIENGESELLSCHAFT (DE) 1980-01-29 US disclosed