SCHEMBL3797797

SCHEMBL3797797

CS(=O)(=O)NCCC[Si](Cl)(Cl)Cl

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.41
ALDH1A1 P00352 3/20 0.39
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA12 O43570 1/20 0.34
CA7 P43166 1/20 0.34
CA14 Q9ULX7 1/20 0.34
NPY5R Q15761 5/20 0.33
MAPT P10636 2/20 0.33
GRIA1 P42261 3/20 0.32
RECQL P46063 1/20 0.32
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10312335 0.79 POLB (0.42) POLBALDH1A1CA1CA2CA12
SCHEMBL26454404 0.77 POLB (0.41) POLBALDH1A1CA1CA2CA12
SCHEMBL12090531 0.77 POLB (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL26454659 0.76 POLB (0.40) POLBALDH1A1CA1CA2CA12
SCHEMBL26455271 0.76 POLB (0.40) POLBALDH1A1CA1CA2CA12
SCHEMBL14740061 0.75 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739265 0.75 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739515 0.75 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739816 0.75 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12
SCHEMBL14739086 0.75 GRIA1 (0.52) POLBALDH1A1CA1CA2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8329263-B2 Method of coating a particle AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2012-12-11 US disclosed
US-20100276310-A1 METHOD OF COATING A PARTICLE AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2010-11-04 US disclosed
WO-2009029053-A1 METHOD OF COATING A PARTICLE AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2009-03-05 WO disclosed
US-7189490-B2 Photoresists containing sulfonamide component SHIPLEY COMPANY, L.L.C. (US) 2007-03-13 US disclosed